Abstract
This paper presents the results of plasma synthesis of silicon nanostructures in an air-argon medium. The synthesis of silicon nanostructures was carried out in a vacuum chamber at a gas mixture pressure of 500 Torr, with partial pressures of argon and air in the ratio of 4:1. Molybdenum and silicon embedded in a copper tube were used as electrodes. Current and voltage were maintained in the range of 8-25 A and 30-50 V, corresponding. As a result of experiments, silicon nanostructures were deposited on the surface of the electrodes. Nanostructures were studied by optical and electron microscopes. Forms of silicon nanostructures were mainly in the form of nanotubes. Their diameters range from 200 nm to 500 nm, and their length reaches 1 mm. On the surface of these nanotubes, nanovilli with a diameter of about 5 nm and a length of 100 nm are observed.
| Original language | English |
|---|---|
| Article number | 012012 |
| Journal | Journal of Physics: Conference Series |
| Volume | 1870 |
| Issue number | 1 |
| DOIs | |
| State | Published - 19 Apr 2021 |
| Externally published | Yes |
| Event | 1st All-Russian Conference with International Participation on Gas Discharge Plasma and Synthesis of Nanostructures, GDP_NANO 2020 - Kazan, Russian Federation Duration: 2 Dec 2020 → 5 Dec 2020 |
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