TY - GEN
T1 - Megasonic Power Supply Design for Precision Cleaning of Nanoimprint Stencils
AU - Yao, Zecheng
AU - Liu, Yanxing
AU - Zhu, Xiangyu
AU - Yang, Liangxuan
AU - Long, Zhili
N1 - Publisher Copyright:
© 2024 IEEE.
PY - 2024
Y1 - 2024
N2 - In the process of nanoimprint lithography, the surface of the template is easily contaminated by various particles, such as dust and photoresist, which directly affect the accuracy and quality of the lithography process. Therefore, the cleaning of the template is particularly crucial. This paper designs a megasonic power supply for the precision cleaning of lithography molds, given the significant advantages of megasonic cleaning technology in this application. The system comprises seven main modules: main control, adjustable DC power supply, drive, power, High-frequency transformers, impedance matching, and voltage and current acquisition. The power conversion and control scheme employs an adjustable DC power module and a half-bridge inverter circuit, enabling stable and accurate control of output power at ultra-high megahertz frequencies. Additionally, the power supply utilizes a two-stage LC impedance matching network with high bandwidth and frequency tracking, ensuring efficient and uniform output of megahertz-level drive electrical signals. Verification has shown that the megasonic power supply can continuously and stably output 400W and 1-3MHz electrical signals to drive the operation of the megasonic transducer.
AB - In the process of nanoimprint lithography, the surface of the template is easily contaminated by various particles, such as dust and photoresist, which directly affect the accuracy and quality of the lithography process. Therefore, the cleaning of the template is particularly crucial. This paper designs a megasonic power supply for the precision cleaning of lithography molds, given the significant advantages of megasonic cleaning technology in this application. The system comprises seven main modules: main control, adjustable DC power supply, drive, power, High-frequency transformers, impedance matching, and voltage and current acquisition. The power conversion and control scheme employs an adjustable DC power module and a half-bridge inverter circuit, enabling stable and accurate control of output power at ultra-high megahertz frequencies. Additionally, the power supply utilizes a two-stage LC impedance matching network with high bandwidth and frequency tracking, ensuring efficient and uniform output of megahertz-level drive electrical signals. Verification has shown that the megasonic power supply can continuously and stably output 400W and 1-3MHz electrical signals to drive the operation of the megasonic transducer.
KW - m-egasonic power supply
KW - megasonic cleaning
KW - nanoimprint lithography
UR - https://www.scopus.com/pages/publications/85214420458
U2 - 10.1109/3M-NANO61605.2024.10769718
DO - 10.1109/3M-NANO61605.2024.10769718
M3 - 会议稿件
AN - SCOPUS:85214420458
T3 - 2024 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2024
SP - 701
EP - 706
BT - 2024 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2024
A2 - Wang, Ying
A2 - Cui, Yuxiao
A2 - Zhang, Jingran
A2 - Yu, Miao
A2 - Wu, Hao
A2 - Wang, Zuobin
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 2024 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2024
Y2 - 29 July 2024 through 2 August 2024
ER -