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Megasonic Power Supply Design for Precision Cleaning of Nanoimprint Stencils

  • Zecheng Yao*
  • , Yanxing Liu
  • , Xiangyu Zhu
  • , Liangxuan Yang
  • , Zhili Long
  • *Corresponding author for this work
  • Dongguan University of Technology
  • Harbin Institute of Technology Shenzhen

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In the process of nanoimprint lithography, the surface of the template is easily contaminated by various particles, such as dust and photoresist, which directly affect the accuracy and quality of the lithography process. Therefore, the cleaning of the template is particularly crucial. This paper designs a megasonic power supply for the precision cleaning of lithography molds, given the significant advantages of megasonic cleaning technology in this application. The system comprises seven main modules: main control, adjustable DC power supply, drive, power, High-frequency transformers, impedance matching, and voltage and current acquisition. The power conversion and control scheme employs an adjustable DC power module and a half-bridge inverter circuit, enabling stable and accurate control of output power at ultra-high megahertz frequencies. Additionally, the power supply utilizes a two-stage LC impedance matching network with high bandwidth and frequency tracking, ensuring efficient and uniform output of megahertz-level drive electrical signals. Verification has shown that the megasonic power supply can continuously and stably output 400W and 1-3MHz electrical signals to drive the operation of the megasonic transducer.

Original languageEnglish
Title of host publication2024 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2024
EditorsYing Wang, Yuxiao Cui, Jingran Zhang, Miao Yu, Hao Wu, Zuobin Wang
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages701-706
Number of pages6
ISBN (Electronic)9798350362107
DOIs
StatePublished - 2024
Externally publishedYes
Event2024 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2024 - Zhongshan, China
Duration: 29 Jul 20242 Aug 2024

Publication series

Name2024 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2024

Conference

Conference2024 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2024
Country/TerritoryChina
CityZhongshan
Period29/07/242/08/24

Keywords

  • m-egasonic power supply
  • megasonic cleaning
  • nanoimprint lithography

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