Mechanism of force mode dip-pen nanolithography

Haijun Yang; Hui Xie; Haixia Wu; Weibin Rong; Lining Sun; Shouwu Guo; Huabin Wang

doi:10.1063/1.4875665

Mechanism of force mode dip-pen nanolithography

Haijun Yang^*
, Hui Xie
, Haixia Wu
, Weibin Rong
, Lining Sun
, Shouwu Guo
, Huabin Wang

^*Corresponding author for this work

School of Mechatronics Engineering

Shanghai Jiao Tong University
Chinese Academy of Sciences
CAS - Chongqing Institute of Green and Intelligent Technology

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

In this work, the underlying mechanism of the force mode dip-pen nanolithography (FMDPN) is investigated in depth by analyzing force curves, tapping mode deflection signals, and "Z-scan" voltage variations during the FMDPN. The operation parameters including the relative "trigger threshold" and "surface delay" parameters are vital to control the loading force and dwell time for ink deposition during FMDPN. A model is also developed to simulate the interactions between the atomic force microscope tip and soft substrate during FMDPN, and verified by its good performance in fitting our experimental data.

Original language	English
Article number	174314
Journal	Journal of Applied Physics
Volume	115
Issue number	17
DOIs	https://doi.org/10.1063/1.4875665
State	Published - 7 May 2014

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AU - Yang, Haijun

AU - Xie, Hui

AU - Wu, Haixia

AU - Rong, Weibin

AU - Sun, Lining

AU - Guo, Shouwu

AU - Wang, Huabin

PY - 2014/5/7

Y1 - 2014/5/7

N2 - In this work, the underlying mechanism of the force mode dip-pen nanolithography (FMDPN) is investigated in depth by analyzing force curves, tapping mode deflection signals, and "Z-scan" voltage variations during the FMDPN. The operation parameters including the relative "trigger threshold" and "surface delay" parameters are vital to control the loading force and dwell time for ink deposition during FMDPN. A model is also developed to simulate the interactions between the atomic force microscope tip and soft substrate during FMDPN, and verified by its good performance in fitting our experimental data.

AB - In this work, the underlying mechanism of the force mode dip-pen nanolithography (FMDPN) is investigated in depth by analyzing force curves, tapping mode deflection signals, and "Z-scan" voltage variations during the FMDPN. The operation parameters including the relative "trigger threshold" and "surface delay" parameters are vital to control the loading force and dwell time for ink deposition during FMDPN. A model is also developed to simulate the interactions between the atomic force microscope tip and soft substrate during FMDPN, and verified by its good performance in fitting our experimental data.

UR - https://www.scopus.com/pages/publications/84903890389

U2 - 10.1063/1.4875665

DO - 10.1063/1.4875665

M3 - 文章

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SN - 0021-8979

VL - 115

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 17

M1 - 174314

ER -

Mechanism of force mode dip-pen nanolithography

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