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Measurement system for wafer bonding strength

  • Li Guo Chen*
  • , Li Ning Sun
  • , Qing An Huang
  • , Tao Chen
  • *Corresponding author for this work
  • Harbin Institute of Technology
  • Southeast University, Nanjing

Research output: Contribution to journalArticlepeer-review

Abstract

Some measurement methods of wafer bonding strength were summarized. The principle of crack-opening method was analyzed and the system parameters and function were presented. A design idea was used to develope the testing system. Some key technique modules including precision positioning, micro-vision, IR measurement and control system are studied respectively. A wafer bonding strength measurement system are designed based on integrating all the modules. Finally, the feasibility of the system is tested by some contrast experiments with different bonding samples.

Original languageEnglish
Pages (from-to)137-140
Number of pages4
JournalJournal of Test and Measurement Technology
Volume19
Issue number2
StatePublished - 2005

Keywords

  • Bond strength
  • Crack-opening
  • Surface energy
  • Test
  • Wafer bonding

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