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Martensitic transformation behavior of Ni54.75Mn 13.25Fe7Ga25 ferromagnetic shape memory thin film

  • Haibo Wang*
  • , Hao Xiong
  • , Li Ma
  • , Wei Cai
  • *Corresponding author for this work
  • TaiZhou University
  • Harbin Institute of Technology

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The Ni54.75Mn13.25Fe7Ga25 (at.%) ferromagnetic shape memory thin film was deposited onto silicon substrates using radio-frequency magnetron sputtering. The martensitic transformation, crystallographic structure, microstructure and magnetic-field induced strain were investigated by means of Differential Scanning Calorimetry (DSC), X-ray diffraction (XRD), Transmission Electron Microscope (TEM) and metal strain gauges. The results show that the martensite transformation temperature Ms is 296.6 K, the film with typical self-accommodated morphology is orthorhombic structure at room temperature. The field-induced strain of 52 ppm is obtained in this shape memory thin film.

Original languageEnglish
Title of host publicationAdvanced Materials and Computer Science
PublisherTrans Tech Publications Ltd
Pages408-412
Number of pages5
ISBN (Print)9783037850978
DOIs
StatePublished - 2011
Externally publishedYes

Publication series

NameKey Engineering Materials
Volume474-476
ISSN (Print)1013-9826
ISSN (Electronic)1662-9795

Keywords

  • Ni-Mn-Fe-Ga
  • Reverse martensitic transformation
  • Self-accommodated morphology
  • Thin film

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