Magnetron sputtering deposition Ti-B-C-N films by Ti/B4C compound target

Guangze Tang; Xinxin Ma; Mingren Sun; Shuyan Xu

doi:10.1016/j.surfcoat.2008.10.038

Magnetron sputtering deposition Ti-B-C-N films by Ti/B₄C compound target

Guangze Tang
, Xinxin Ma^*
, Mingren Sun
, Shuyan Xu

^*Corresponding author for this work

Harbin Institute of Technology
Northeast Forestry University

Research output: Contribution to journal › Article › peer-review

12 Scopus citations

Abstract

Ti-B-C-N films were deposited by unbalanced DC magnetron sputtering with Ti/B₄C compound target. The sputtering zone in the surface of the target was adjusted by a magnetic coil. X-ray photoelectron spectrum, X-ray diffraction, nano-indentation and scratch tests were used to analyze the film composition, phase structure, hardness, modulus and scratch resistance. The results showed that the composition of the Ti-B-C-N films can be adjusted by changing deposition parameters, such as gas ratio of N₂ to Ar and the magnetron coil current. The main crystal phase in the films was TiB₂. The proportion of crystalline TiB₂ decreased with the increasing of N₂ partial pressure and reached a maximum value at 300 mA magnetic coil current, when the coil current changed from 200 mA to 500 mA. The films containing more TiB₂ proportion showed higher hardness and modulus. The scratch resistance of the films increased with the films hardness.

Original language	English
Pages (from-to)	1288-1291
Number of pages	4
Journal	Surface and Coatings Technology
Volume	203
Issue number	9
DOIs	https://doi.org/10.1016/j.surfcoat.2008.10.038
State	Published - 25 Jan 2009
Externally published	Yes

Keywords

Hardness
Magnetron sputtering deposition
Scratch test
Ti-B-C-N films
X-ray

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10.1016/j.surfcoat.2008.10.038

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@article{4dde9efe8a4b46119a75bf427fc95182,

title = "Magnetron sputtering deposition Ti-B-C-N films by Ti/B4C compound target",

abstract = "Ti-B-C-N films were deposited by unbalanced DC magnetron sputtering with Ti/B4C compound target. The sputtering zone in the surface of the target was adjusted by a magnetic coil. X-ray photoelectron spectrum, X-ray diffraction, nano-indentation and scratch tests were used to analyze the film composition, phase structure, hardness, modulus and scratch resistance. The results showed that the composition of the Ti-B-C-N films can be adjusted by changing deposition parameters, such as gas ratio of N2 to Ar and the magnetron coil current. The main crystal phase in the films was TiB2. The proportion of crystalline TiB2 decreased with the increasing of N2 partial pressure and reached a maximum value at 300 mA magnetic coil current, when the coil current changed from 200 mA to 500 mA. The films containing more TiB2 proportion showed higher hardness and modulus. The scratch resistance of the films increased with the films hardness.",

keywords = "Hardness, Magnetron sputtering deposition, Scratch test, Ti-B-C-N films, X-ray",

author = "Guangze Tang and Xinxin Ma and Mingren Sun and Shuyan Xu",

year = "2009",

month = jan,

day = "25",

doi = "10.1016/j.surfcoat.2008.10.038",

language = "英语",

volume = "203",

pages = "1288--1291",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

number = "9",

}

TY - JOUR

T1 - Magnetron sputtering deposition Ti-B-C-N films by Ti/B4C compound target

AU - Tang, Guangze

AU - Ma, Xinxin

AU - Sun, Mingren

AU - Xu, Shuyan

PY - 2009/1/25

Y1 - 2009/1/25

N2 - Ti-B-C-N films were deposited by unbalanced DC magnetron sputtering with Ti/B4C compound target. The sputtering zone in the surface of the target was adjusted by a magnetic coil. X-ray photoelectron spectrum, X-ray diffraction, nano-indentation and scratch tests were used to analyze the film composition, phase structure, hardness, modulus and scratch resistance. The results showed that the composition of the Ti-B-C-N films can be adjusted by changing deposition parameters, such as gas ratio of N2 to Ar and the magnetron coil current. The main crystal phase in the films was TiB2. The proportion of crystalline TiB2 decreased with the increasing of N2 partial pressure and reached a maximum value at 300 mA magnetic coil current, when the coil current changed from 200 mA to 500 mA. The films containing more TiB2 proportion showed higher hardness and modulus. The scratch resistance of the films increased with the films hardness.

AB - Ti-B-C-N films were deposited by unbalanced DC magnetron sputtering with Ti/B4C compound target. The sputtering zone in the surface of the target was adjusted by a magnetic coil. X-ray photoelectron spectrum, X-ray diffraction, nano-indentation and scratch tests were used to analyze the film composition, phase structure, hardness, modulus and scratch resistance. The results showed that the composition of the Ti-B-C-N films can be adjusted by changing deposition parameters, such as gas ratio of N2 to Ar and the magnetron coil current. The main crystal phase in the films was TiB2. The proportion of crystalline TiB2 decreased with the increasing of N2 partial pressure and reached a maximum value at 300 mA magnetic coil current, when the coil current changed from 200 mA to 500 mA. The films containing more TiB2 proportion showed higher hardness and modulus. The scratch resistance of the films increased with the films hardness.

KW - Hardness

KW - Magnetron sputtering deposition

KW - Scratch test

KW - Ti-B-C-N films

KW - X-ray

UR - https://www.scopus.com/pages/publications/58149507966

U2 - 10.1016/j.surfcoat.2008.10.038

DO - 10.1016/j.surfcoat.2008.10.038

M3 - 文章

AN - SCOPUS:58149507966

SN - 0257-8972

VL - 203

SP - 1288

EP - 1291

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 9

ER -

Magnetron sputtering deposition Ti-B-C-N films by Ti/B₄C compound target

Abstract

Keywords

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