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Low-temperature diffusion bonding of pure aluminum

  • Haiyan Chen
  • , Jian Cao*
  • , Xiaoyu Tian
  • , Rui Li
  • , Jicai Feng
  • *Corresponding author for this work
  • Harbin Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

1 keV argon ion beam was employed to remove the oxide film of pure aluminum before diffusion bonding. A sound joint of pure aluminum was obtained by ion activation-assisted diffusion bonding at the low temperature of 350 °C, while the high-quality joining of pure aluminum was infeasible by conventional diffusion bonding at the temperature lower than 500 °C. The residual oxide film ratios of joints decreased with the increase of ion cleaning time. When the specimens were cleaned for 120 min, the joint with the maximum tensile strength of 62.3 MPa and the elongation of 14.1 % was obtained. The argon ion beam etching surface treatment provides a new route for the low-temperature diffusion bonding. The reliable diffusion bonded joint of pure aluminum indicates that low-temperature diffusion bonding is feasible for bulk materials, especially for materials with the outstanding plasticity.

Original languageEnglish
Pages (from-to)101-104
Number of pages4
JournalApplied Physics A: Materials Science and Processing
Volume113
Issue number1
DOIs
StatePublished - Oct 2013

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