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Long working distance microscope with a low obscuration aspherical Schwarzschild objective

  • Jiubin Tan
  • , Chao Wang
  • , Yuan Wang
  • , Weibo Wang
  • , Jian Liu*
  • , Richard Leach
  • , Ling Hao
  • *Corresponding author for this work
  • Harbin Institute of Technology
  • University of Nottingham
  • National Physical Laboratory

Research output: Contribution to journalArticlepeer-review

Abstract

For fine stitching of multiwindow wide-spectrum detectors, an aspherical Schwarzschild objective with an effective working distance of 525 mm has been realized for chromatic aberration-free imaging in 400-900 nm wavelength range and with a numerical aperture of 0.13. A theoretical approach for analytical design of an initial configuration has been modeled using anon-axis Taylor series expansion, and the beam obscuration ratio (OR) has been controlled down to 4%. In comparison against the theoretical spherical-based Schwarzschild objective, 77.5% of the OR has been reduced for improved contrast.

Original languageEnglish
Pages (from-to)6699-6702
Number of pages4
JournalOptics Letters
Volume39
Issue number23
DOIs
StatePublished - 1 Dec 2014

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