Local field enhancement characteristics in a tapered metal-coated optical fiber probe for nanolithography

Jianlei Cui; Lijun Yang; Yang Wang; Xuesong Mei; Wenjun Wang; Chaojian Hou; Bai Cheng; Qiang Dai

doi:10.1080/10584587.2015.1044874

Local field enhancement characteristics in a tapered metal-coated optical fiber probe for nanolithography

Jianlei Cui
, Lijun Yang^*
, Yang Wang
, Xuesong Mei
, Wenjun Wang
, Chaojian Hou
, Bai Cheng
, Qiang Dai

^*Corresponding author for this work

School of Mechatronics Engineering

Xi'an Jiaotong University
School of Mechanical Engineering
School of Mechatronics Engineering, Harbin Institute of Technology
Harbin Institute of Technology

Research output: Contribution to journal › Article › peer-review

28 Scopus citations

Abstract

In the nanolithography, some exciting developments have been motivated by the tapered metal-coated optical fiber probe irradiated by ultra-fast pulse laser. To explore the related mechanism, the local field is studied using the finite element method in this paper. The simulation results show the reflection at the cut-off plane, edge enhancement effect and surface plasmon resonance become the major factors affecting the near-field. In addition, Based on the near-field distribution and characteristics, the new promising scheme is proposed for near-field nanolithography.

Original language	English
Pages (from-to)	90-97
Number of pages	8
Journal	Integrated Ferroelectrics
Volume	164
Issue number	1
DOIs	https://doi.org/10.1080/10584587.2015.1044874
State	Published - 2015

Keywords

Enhancement
Nanolithography
Near-field
Optical fiber probe

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10.1080/10584587.2015.1044874

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@article{da904abde49c44e4a1394d2209b911ec,

title = "Local field enhancement characteristics in a tapered metal-coated optical fiber probe for nanolithography",

abstract = "In the nanolithography, some exciting developments have been motivated by the tapered metal-coated optical fiber probe irradiated by ultra-fast pulse laser. To explore the related mechanism, the local field is studied using the finite element method in this paper. The simulation results show the reflection at the cut-off plane, edge enhancement effect and surface plasmon resonance become the major factors affecting the near-field. In addition, Based on the near-field distribution and characteristics, the new promising scheme is proposed for near-field nanolithography.",

keywords = "Enhancement, Nanolithography, Near-field, Optical fiber probe",

author = "Jianlei Cui and Lijun Yang and Yang Wang and Xuesong Mei and Wenjun Wang and Chaojian Hou and Bai Cheng and Qiang Dai",

note = "Publisher Copyright: Copyright {\textcopyright} Taylor \& Francis Group, LLC.",

year = "2015",

doi = "10.1080/10584587.2015.1044874",

language = "英语",

volume = "164",

pages = "90--97",

journal = "Integrated Ferroelectrics",

issn = "1058-4587",

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}

TY - JOUR

T1 - Local field enhancement characteristics in a tapered metal-coated optical fiber probe for nanolithography

AU - Cui, Jianlei

AU - Yang, Lijun

AU - Wang, Yang

AU - Mei, Xuesong

AU - Wang, Wenjun

AU - Hou, Chaojian

AU - Cheng, Bai

AU - Dai, Qiang

PY - 2015

Y1 - 2015

N2 - In the nanolithography, some exciting developments have been motivated by the tapered metal-coated optical fiber probe irradiated by ultra-fast pulse laser. To explore the related mechanism, the local field is studied using the finite element method in this paper. The simulation results show the reflection at the cut-off plane, edge enhancement effect and surface plasmon resonance become the major factors affecting the near-field. In addition, Based on the near-field distribution and characteristics, the new promising scheme is proposed for near-field nanolithography.

AB - In the nanolithography, some exciting developments have been motivated by the tapered metal-coated optical fiber probe irradiated by ultra-fast pulse laser. To explore the related mechanism, the local field is studied using the finite element method in this paper. The simulation results show the reflection at the cut-off plane, edge enhancement effect and surface plasmon resonance become the major factors affecting the near-field. In addition, Based on the near-field distribution and characteristics, the new promising scheme is proposed for near-field nanolithography.

KW - Enhancement

KW - Nanolithography

KW - Near-field

KW - Optical fiber probe

UR - https://www.scopus.com/pages/publications/84954181736

U2 - 10.1080/10584587.2015.1044874

DO - 10.1080/10584587.2015.1044874

M3 - 文章

AN - SCOPUS:84954181736

SN - 1058-4587

VL - 164

SP - 90

EP - 97

JO - Integrated Ferroelectrics

JF - Integrated Ferroelectrics

IS - 1

ER -

Local field enhancement characteristics in a tapered metal-coated optical fiber probe for nanolithography

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Keywords

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