Abstract
The resistance to fracture of thin ductile polymer layers used to bond stiff elastic substrates together is an important design parameter in a variety of applications involving thin ceramic, glass and metal substrates. This work in particular addresses the local elasto-plastic fracture processes of pressure-sensitive polymers used as adhesive layers in silicon wafer bonded systems. Stress and deformation fields under mode I conditions are obtained using a new pressure-sensitive rate-independent constitutive material model for polyimide. Detailed computational analyses of a typical mode I delamination test specimen are performed to determine the highly constrained local deformation of the thin bonding layer. An investigation of the competing failure mechanisms revealed that a likely failure mode will consist of interfacial debonding at the site which develops the maximum traction. The low levels of hydrostatic pressure within the polymer suggest that no triaxiality-induced cavitation is likely to occur in pressure sensitive adhesives obeying associated plastic flow. A relation is proposed which gives the fracture strength of the bond (or critical energy release rate for interface failure) in terms of the thickness of the bonding layer.
| Original language | English |
|---|---|
| Pages | 133-140 |
| Number of pages | 8 |
| State | Published - 1995 |
| Externally published | Yes |
| Event | Proceedings of the 1995 ASME International Mechanical Engineering Congress and Exposition - San Francisco, CA, USA Duration: 12 Nov 1995 → 17 Nov 1995 |
Conference
| Conference | Proceedings of the 1995 ASME International Mechanical Engineering Congress and Exposition |
|---|---|
| City | San Francisco, CA, USA |
| Period | 12/11/95 → 17/11/95 |
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