Line-structure parameters measurement of single-crystal-silicon step based on multi-scale analysis

Hongbo Li; Xuezeng Zhao

doi:10.1109/WCICA.2006.1713323

Line-structure parameters measurement of single-crystal-silicon step based on multi-scale analysis

Hongbo Li^*
, Xuezeng Zhao

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Scopus citations

Abstract

To detect side edges of single-crystal-silicon step scanned by AFM, the measurement data of the step are analyzed using wavelet theory. After the texture in different scale of image is detected, which have the character of multi-scale resolution and multi-orientational sub-image, the side edges of the step are reconstructed according to the character of AFM. Then the line-structure parameters of the step are calculated respectively based on analyzing the detected edge character, such as line-width, line-width roughness and line edge roughness. Since multi-scale analysis supports that lager-scale sub-image approaches original image and smaller-scale sub-image gives more details of original one, it has more potential in the exact parameters research of step topography.

Original language	English
Title of host publication	Proceedings of the World Congress on Intelligent Control and Automation (WCICA)
Pages	4931-4934
Number of pages	4
DOIs	https://doi.org/10.1109/WCICA.2006.1713323
State	Published - 2006
Event	6th World Congress on Intelligent Control and Automation, WCICA 2006 - Dalian, China Duration: 21 Jun 2006 → 23 Jun 2006

Publication series

Name	Proceedings of the World Congress on Intelligent Control and Automation (WCICA)
Volume	1

Conference

Conference	6th World Congress on Intelligent Control and Automation, WCICA 2006
Country/Territory	China
City	Dalian
Period	21/06/06 → 23/06/06

Keywords

AFM
Center B spline wavelet
Line edge roughness
Line width
Line width roughness

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10.1109/WCICA.2006.1713323

Cite this

Li, H., & Zhao, X. (2006). Line-structure parameters measurement of single-crystal-silicon step based on multi-scale analysis. In Proceedings of the World Congress on Intelligent Control and Automation (WCICA) (pp. 4931-4934). Article 1713323 (Proceedings of the World Congress on Intelligent Control and Automation (WCICA); Vol. 1). https://doi.org/10.1109/WCICA.2006.1713323

@inproceedings{394ec8c8432f4e54b63966ca93f49f7f,

title = "Line-structure parameters measurement of single-crystal-silicon step based on multi-scale analysis",

abstract = "To detect side edges of single-crystal-silicon step scanned by AFM, the measurement data of the step are analyzed using wavelet theory. After the texture in different scale of image is detected, which have the character of multi-scale resolution and multi-orientational sub-image, the side edges of the step are reconstructed according to the character of AFM. Then the line-structure parameters of the step are calculated respectively based on analyzing the detected edge character, such as line-width, line-width roughness and line edge roughness. Since multi-scale analysis supports that lager-scale sub-image approaches original image and smaller-scale sub-image gives more details of original one, it has more potential in the exact parameters research of step topography.",

keywords = "AFM, Center B spline wavelet, Line edge roughness, Line width, Line width roughness",

author = "Hongbo Li and Xuezeng Zhao",

year = "2006",

doi = "10.1109/WCICA.2006.1713323",

language = "英语",

isbn = "1424403324",

series = "Proceedings of the World Congress on Intelligent Control and Automation (WCICA)",

pages = "4931--4934",

booktitle = "Proceedings of the World Congress on Intelligent Control and Automation (WCICA)",

note = "6th World Congress on Intelligent Control and Automation, WCICA 2006 ; Conference date: 21-06-2006 Through 23-06-2006",

}

Li, H & Zhao, X 2006, Line-structure parameters measurement of single-crystal-silicon step based on multi-scale analysis. in Proceedings of the World Congress on Intelligent Control and Automation (WCICA)., 1713323, Proceedings of the World Congress on Intelligent Control and Automation (WCICA), vol. 1, pp. 4931-4934, 6th World Congress on Intelligent Control and Automation, WCICA 2006, Dalian, China, 21/06/06. https://doi.org/10.1109/WCICA.2006.1713323

Line-structure parameters measurement of single-crystal-silicon step based on multi-scale analysis. / Li, Hongbo ; Zhao, Xuezeng.
Proceedings of the World Congress on Intelligent Control and Automation (WCICA). 2006. p. 4931-4934 1713323 (Proceedings of the World Congress on Intelligent Control and Automation (WCICA); Vol. 1).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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AU - Li, Hongbo

AU - Zhao, Xuezeng

PY - 2006

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N2 - To detect side edges of single-crystal-silicon step scanned by AFM, the measurement data of the step are analyzed using wavelet theory. After the texture in different scale of image is detected, which have the character of multi-scale resolution and multi-orientational sub-image, the side edges of the step are reconstructed according to the character of AFM. Then the line-structure parameters of the step are calculated respectively based on analyzing the detected edge character, such as line-width, line-width roughness and line edge roughness. Since multi-scale analysis supports that lager-scale sub-image approaches original image and smaller-scale sub-image gives more details of original one, it has more potential in the exact parameters research of step topography.

AB - To detect side edges of single-crystal-silicon step scanned by AFM, the measurement data of the step are analyzed using wavelet theory. After the texture in different scale of image is detected, which have the character of multi-scale resolution and multi-orientational sub-image, the side edges of the step are reconstructed according to the character of AFM. Then the line-structure parameters of the step are calculated respectively based on analyzing the detected edge character, such as line-width, line-width roughness and line edge roughness. Since multi-scale analysis supports that lager-scale sub-image approaches original image and smaller-scale sub-image gives more details of original one, it has more potential in the exact parameters research of step topography.

KW - AFM

KW - Center B spline wavelet

KW - Line edge roughness

KW - Line width

KW - Line width roughness

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BT - Proceedings of the World Congress on Intelligent Control and Automation (WCICA)

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Y2 - 21 June 2006 through 23 June 2006

ER -

Line-structure parameters measurement of single-crystal-silicon step based on multi-scale analysis

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Keywords

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