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Kinetic study of electroless copper with glycine as complexing agent

  • D. Y. Li
  • , N. Li*
  • , N. Xiao
  • , Z. Y. Zhu
  • , F. F. Wang
  • *Corresponding author for this work
  • School of Chemistry and Chemical Engineering, Harbin Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

In this work, the effect of Cu2+, Ni2+, glycine, sodium hypophosphite, pH value and temperature on the deposition velocity was studied by weight method. In addition, the deposition rate equation was calculated in the system using glycine as the complexing agent and sodium hypophosphite as the reducing agent.

Original languageEnglish
Pages (from-to)3679-3681
Number of pages3
JournalAsian Journal of Chemistry
Volume25
Issue number7
DOIs
StatePublished - 2013
Externally publishedYes

Keywords

  • Electroless copper plating
  • Glycine
  • Rate equation
  • Sodium hypophosphite

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