Is it possible to dynamical monitoring the products of silane conversion in plasma with non-local characteristics using probe diagnostics?

The paper presents an analysis of the possibility of recording conversion products of small silane SiH₄ impurities in helium in plasma with non-local characteristics using the method of plasma electron spectroscopy based on the technique of probe diagnostics. The formation of peaks on the high-energy part of the second derivatives of probe current–voltage characteristics (CVC) is shown in dynamics and steady-state mode both in a closed reactor and with continuous pumping of the plasma-forming mixture. The peaks correspond to different groups of fast electrons formed as a result of Penning ionization reactions of silane SiH₄ molecules and its conversion products in the dynamics of Si, SiH, SiH₂, SiH₃. The registered reaction products are substantiated using simulations within the framework of an extended fluid model. The formation of negative ions in dynamics has been recorded in the form of a growing peak near the plasma potential on the second derivatives of probe CVC.