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Irradiation effects of 1 MeV electron on monolayer MoS2 field effect transistors

  • Harbin Institute of Technology
  • China Aerospace Science and Technology Corporation
  • China Electronics Technology Group Corporation
  • Harbin Institute of Technology

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The effect of irradiation on monolayer MoS2 FET (field effect transistor) with 1 MeV electron beams was investigated. Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) was measured before and after irradiation. The results show that electron irradiation produces a strong desulfurization effect. The electrical characteristics of the device were measured with fluence condition of 1.0×1012 and 3.0×1012cm-2. The channel leakage increases after irradiation while transfer and output current decrease. This phenomenon can be attributed to the combination of the states at the SiO2/MoS2 interfaces and Coulomb scattering. Our study will enhance the understanding of the influence of 1 MeV electron on MoS2-based nanoelectronics devices.

Original languageEnglish
Title of host publication26th International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2019
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781728135526
DOIs
StatePublished - 1 Jul 2019
Event26th International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2019 - Hangzhou, China
Duration: 2 Jul 20195 Jul 2019

Publication series

NameProceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA

Conference

Conference26th International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 2019
Country/TerritoryChina
CityHangzhou
Period2/07/195/07/19

Keywords

  • Electrical characteristics
  • Electron irradiation
  • Field effect transistor
  • MoS2

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