Ion kinetic energy control in dual plasma deposition of thin films

The dual plasma deposition with respect to the pulse width and frequency of the applied voltage was investigated to avoid electrical breakdown of the film. The electric field in the insulating layer was determined by the voltage between the surface of the film and the substrate for the dual plasma deposition of an insulating thin film. It was found that charge accumulation induces a space charge region in the surface region of the substrate if the substrate is semiconducting.