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Ion enhanced deposition by dual titanium and acetylene plasma immersion ion implantation

  • Z. M. Zeng
  • , X. B. Tian
  • , P. K. Chu*
  • *Corresponding author for this work
  • City University of Hong Kong

Research output: Contribution to journalArticlepeer-review

Abstract

Metal plasma immersion ion implantation and deposition (MePIII-D) is a deposition technique combining metal film deposition using a vacuum arc plasma source with the immersion characteristics of PIII. Thus, TiN or TiC films deposited on steels by PIII and MePIII-d to improve surface properties such as wear, friction, and corrosion are reported. This paper combines gaseous C2H2 PIII with titanium MePIII-D using a vacuum arc plasma source in an effort to obtain a hard coating exhibiting more superior properties. The results show that a film with a multiple-layered structure formed on the 9Cr18 steel exhibits significantly improved wear resistance and frictional properties.

Original languageEnglish
Pages (from-to)175-179
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume21
Issue number1
DOIs
StatePublished - Jan 2003
Externally publishedYes

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