Abstract
The phase formation, composition and interface structure of PtSi/GexS1-x/Si were monitored by AES and HREM, the Schottky and infrared absorption characteristics were investigated by I-V and FTIR. The preparation conditions of the high quality PtSi/Si nanometer size films by pulsed laser deposition and molecular beam epitaxy were explored. In addition, the effects of formation conditions and interface structure on the photoelectric properties were investigated also. The technical foundation is provided for the materials of high performance detectors.
| Original language | English |
|---|---|
| Pages (from-to) | 410-411 |
| Number of pages | 2 |
| Journal | Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering |
| Volume | 30 |
| Issue number | SUPPL. |
| State | Published - 2001 |
| Externally published | Yes |
Keywords
- Heterojunction
- Infrared detectors
- Interface structure
- Photoelectric property
- Photoelectric thin films
Fingerprint
Dive into the research topics of 'Interface structure and photoelectric properties of heterojunction thin films materials'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver