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Interface structure and photoelectric properties of heterojunction thin films materials

  • Meicheng Li*
  • , Wei Cai
  • , Jinghua Yin
  • , Xuekang Chen
  • , Liancheng Zhao
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The phase formation, composition and interface structure of PtSi/GexS1-x/Si were monitored by AES and HREM, the Schottky and infrared absorption characteristics were investigated by I-V and FTIR. The preparation conditions of the high quality PtSi/Si nanometer size films by pulsed laser deposition and molecular beam epitaxy were explored. In addition, the effects of formation conditions and interface structure on the photoelectric properties were investigated also. The technical foundation is provided for the materials of high performance detectors.

Original languageEnglish
Pages (from-to)410-411
Number of pages2
JournalXiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering
Volume30
Issue numberSUPPL.
StatePublished - 2001
Externally publishedYes

Keywords

  • Heterojunction
  • Infrared detectors
  • Interface structure
  • Photoelectric property
  • Photoelectric thin films

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