Influence of thickness and dielectric properties on implantation efficacy in plasma immersion ion implantation of insulators

The effects of the thickness and dielectric properties of the insulating sample on the nitrogen sample on the nitrogen plasma immersion ion implantation (PIII) efficacy were studied using the dynamic sheath model. The nitrogen depth profiles acquired by SIMS were used to corroborate the theoretical approach under different conditions. The use of mesh-assisted PIII with an electrically conducting cage to enhance the implantation efficacy was also compared. The results indicate that a low plasma density induces less surface charges and higher surface potential.