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Influence of dopants Ti and Ni on dehydrogenation properties of NaAlH 4: Electronic structure mechanisms

  • Y. Song*
  • , J. H. Dai
  • , C. G. Li
  • , R. Yang
  • *Corresponding author for this work
  • Harbin Institute of Technology
  • CAS - Institute of Metal Research

Research output: Contribution to journalArticlepeer-review

Abstract

We report on a study of influence of dopants (Ti and Ni) on the dehydrogenation properties of NaAlH4 using the ab initio density functional method. Calculations show that the influence of dopants on the electronic structure is much localized; only the electronic structures of atoms in the vicinity of the dopants were changed. The mechanisms by which Ti improves the dehydrogenation properties of NaAlH4 are sensitive to the occupation of Ti in NaAlH4. If Ti substitutes for an Al atom, it may form Ti-Al intermetallics, and if it occupies an interstitial site, it may "capture" H atoms to form TiH2 phase. In both cases, the [AlH4] groups were dramatically distorted, which is the main reason why Ti dopant improves the dehydrogenation properties of NaAlH4. The influence of Ni on the dehydrogenation properties of NaAlH4 is relatively in weak comparison to the Ti dopant, mainly because the Ni only affects the electronic distribution in its vicinity, and so no significant changes of the [AlH4] groups were observed in Ni doped systems.

Original languageEnglish
Pages (from-to)10215-10221
Number of pages7
JournalJournal of Physical Chemistry C
Volume113
Issue number23
DOIs
StatePublished - 11 Jun 2009
Externally publishedYes

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