Influence of distance between target and substrate on morphology and distribution of macroparticles during arc ion plating

TiN films were deposited on substrate with different distance between target and substrate by arc ion plating method, the morphology and distribution of macroparticles (MPs) is focused on. The surface morphologies of TiN films were observed by scanning electron microscopy (SEM) method. The amount and size of Ti MPs were analyzed by scientific image software Image J. The results show that with the increase of distance between target and substrate, the amount of MPs on the film surface decreases rapidly. In the 15 cm location close to the arc source, the number of MPs is maximum, a typical strip shape MPs are appeared. Meanwhile the area ratio of the MPs is also maximum. In order to balance the deposition rate of film and eliminate the disadvantage effects of MPs, the optimal distance between target and substrate is in the range of 20-30 cm.