Influence of bias voltage on the hardness and toughness of CrAlN coatings via magnetron sputtering

Yu Xi Wang; Sam Zhang; Jyh Wei Lee; Wen Siang Lew; Bo Li

doi:10.1016/j.surfcoat.2012.06.041

Influence of bias voltage on the hardness and toughness of CrAlN coatings via magnetron sputtering

Yu Xi Wang
, Sam Zhang^*
, Jyh Wei Lee
, Wen Siang Lew
, Bo Li

^*Corresponding author for this work

Nanyang Technological University
Ming Chi University of Technology
China Iron and Steel Research Institute Group

Research output: Contribution to journal › Article › peer-review

96 Scopus citations

Abstract

Chromium aluminum nitride (CrAlN) coatings were prepared via magnetron sputtering in a mixed Ar and N ₂ ambient. The effect of negative bias voltage (V _b) on the microstructure was investigated using a spectrum of characterizing techniques in terms of Glancing Angle X-ray Diffractometry, Field Emission Scanning Electron Microscopy and Transmission Electron Microscopy. As V _b increased from 50 to 260V, hardness was improved from 10 to 26GPa. Toughness grew at the same time and maximized at around 2MPa·m ^1/2 when V _b=210V. Simultaneous improvements in hardness and toughness were attributed to the densified microstructure with refined grains and increased compressive stress.

Original language	English
Pages (from-to)	5103-5107
Number of pages	5
Journal	Surface and Coatings Technology
Volume	206
Issue number	24
DOIs	https://doi.org/10.1016/j.surfcoat.2012.06.041
State	Published - 15 Aug 2012
Externally published	Yes

Keywords

Bias voltage
CrAlN
Microstructure
Toughness

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10.1016/j.surfcoat.2012.06.041

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title = "Influence of bias voltage on the hardness and toughness of CrAlN coatings via magnetron sputtering",

abstract = "Chromium aluminum nitride (CrAlN) coatings were prepared via magnetron sputtering in a mixed Ar and N 2 ambient. The effect of negative bias voltage (V b) on the microstructure was investigated using a spectrum of characterizing techniques in terms of Glancing Angle X-ray Diffractometry, Field Emission Scanning Electron Microscopy and Transmission Electron Microscopy. As V b increased from 50 to 260V, hardness was improved from 10 to 26GPa. Toughness grew at the same time and maximized at around 2MPa·m 1/2 when V b=210V. Simultaneous improvements in hardness and toughness were attributed to the densified microstructure with refined grains and increased compressive stress.",

keywords = "Bias voltage, CrAlN, Microstructure, Toughness",

author = "Wang, \{Yu Xi\} and Sam Zhang and Lee, \{Jyh Wei\} and Lew, \{Wen Siang\} and Bo Li",

year = "2012",

month = aug,

day = "15",

doi = "10.1016/j.surfcoat.2012.06.041",

language = "英语",

volume = "206",

pages = "5103--5107",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

number = "24",

}

TY - JOUR

T1 - Influence of bias voltage on the hardness and toughness of CrAlN coatings via magnetron sputtering

AU - Wang, Yu Xi

AU - Zhang, Sam

AU - Lee, Jyh Wei

AU - Lew, Wen Siang

AU - Li, Bo

PY - 2012/8/15

Y1 - 2012/8/15

N2 - Chromium aluminum nitride (CrAlN) coatings were prepared via magnetron sputtering in a mixed Ar and N 2 ambient. The effect of negative bias voltage (V b) on the microstructure was investigated using a spectrum of characterizing techniques in terms of Glancing Angle X-ray Diffractometry, Field Emission Scanning Electron Microscopy and Transmission Electron Microscopy. As V b increased from 50 to 260V, hardness was improved from 10 to 26GPa. Toughness grew at the same time and maximized at around 2MPa·m 1/2 when V b=210V. Simultaneous improvements in hardness and toughness were attributed to the densified microstructure with refined grains and increased compressive stress.

AB - Chromium aluminum nitride (CrAlN) coatings were prepared via magnetron sputtering in a mixed Ar and N 2 ambient. The effect of negative bias voltage (V b) on the microstructure was investigated using a spectrum of characterizing techniques in terms of Glancing Angle X-ray Diffractometry, Field Emission Scanning Electron Microscopy and Transmission Electron Microscopy. As V b increased from 50 to 260V, hardness was improved from 10 to 26GPa. Toughness grew at the same time and maximized at around 2MPa·m 1/2 when V b=210V. Simultaneous improvements in hardness and toughness were attributed to the densified microstructure with refined grains and increased compressive stress.

KW - Bias voltage

KW - CrAlN

KW - Microstructure

KW - Toughness

UR - https://www.scopus.com/pages/publications/84864134629

U2 - 10.1016/j.surfcoat.2012.06.041

DO - 10.1016/j.surfcoat.2012.06.041

M3 - 文章

AN - SCOPUS:84864134629

SN - 0257-8972

VL - 206

SP - 5103

EP - 5107

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 24

ER -

Influence of bias voltage on the hardness and toughness of CrAlN coatings via magnetron sputtering

Abstract

Keywords

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