Influence of annealing on mechanics behaviors of oxygen-implanted layer on Ti6Al4V by plasma-based ion implantation

Li Jinlong; Sun Mingren; Ma Xinxin; Huang Feng; Xue Qunji

doi:10.1016/j.surfcoat.2012.06.001

Influence of annealing on mechanics behaviors of oxygen-implanted layer on Ti6Al4V by plasma-based ion implantation

Li Jinlong^*
, Sun Mingren
, Ma Xinxin
, Huang Feng
, Xue Qunji

^*Corresponding author for this work

CAS - Ningbo Institute of Material Technology and Engineering
Harbin Institute of Technology

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

Ti6Al4V was implanted by oxygen plasma based ion implantation at pulsed negative voltages of 50kV with a fluence of 4×10¹⁷ O/cm². The implanting temperature of below 180°C was controlled by an oil cooling working table. Subsequent annealing was applied the implanted samples in vacuum at 600°C, 650°C and 700°C, respectively. The influence of annealing conditions on hardness and scratch resistance of the oxygen-implanted layer was investigated. The annealing at a lower temperature below 650°C makes the hardness peak widen and shift into the substrate. Scratch resistance of the oxygen implanted layer also was improved significantly. While the temperature increases to 650°C and 700°C, annealing induces a hardness valley value, which is even far lower than that of the substrate. At the same time, scratch resistance deteriorates for the oxygen implanted layer. All annealing samples have a higher elasticity recover than the implanted samples.

Original language	English
Pages (from-to)	S224-S227
Journal	Surface and Coatings Technology
Volume	228
Issue number	SUPPL.1
DOIs	https://doi.org/10.1016/j.surfcoat.2012.06.001
State	Published - 15 Aug 2013
Externally published	Yes

Keywords

Annealing
Hardness
Oxygen-implanted layer
Scratch resistance
Ti6Al4V

Access to Document

10.1016/j.surfcoat.2012.06.001

Cite this

@article{98e5cb57a5304f348cbc60d3d73d3497,

title = "Influence of annealing on mechanics behaviors of oxygen-implanted layer on Ti6Al4V by plasma-based ion implantation",

abstract = "Ti6Al4V was implanted by oxygen plasma based ion implantation at pulsed negative voltages of 50kV with a fluence of 4×1017 O/cm2. The implanting temperature of below 180°C was controlled by an oil cooling working table. Subsequent annealing was applied the implanted samples in vacuum at 600°C, 650°C and 700°C, respectively. The influence of annealing conditions on hardness and scratch resistance of the oxygen-implanted layer was investigated. The annealing at a lower temperature below 650°C makes the hardness peak widen and shift into the substrate. Scratch resistance of the oxygen implanted layer also was improved significantly. While the temperature increases to 650°C and 700°C, annealing induces a hardness valley value, which is even far lower than that of the substrate. At the same time, scratch resistance deteriorates for the oxygen implanted layer. All annealing samples have a higher elasticity recover than the implanted samples.",

keywords = "Annealing, Hardness, Oxygen-implanted layer, Scratch resistance, Ti6Al4V",

author = "Li Jinlong and Sun Mingren and Ma Xinxin and Huang Feng and Xue Qunji",

year = "2013",

month = aug,

day = "15",

doi = "10.1016/j.surfcoat.2012.06.001",

language = "英语",

volume = "228",

pages = "S224--S227",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

number = "SUPPL.1",

}

TY - JOUR

T1 - Influence of annealing on mechanics behaviors of oxygen-implanted layer on Ti6Al4V by plasma-based ion implantation

AU - Jinlong, Li

AU - Mingren, Sun

AU - Xinxin, Ma

AU - Feng, Huang

AU - Qunji, Xue

PY - 2013/8/15

Y1 - 2013/8/15

N2 - Ti6Al4V was implanted by oxygen plasma based ion implantation at pulsed negative voltages of 50kV with a fluence of 4×1017 O/cm2. The implanting temperature of below 180°C was controlled by an oil cooling working table. Subsequent annealing was applied the implanted samples in vacuum at 600°C, 650°C and 700°C, respectively. The influence of annealing conditions on hardness and scratch resistance of the oxygen-implanted layer was investigated. The annealing at a lower temperature below 650°C makes the hardness peak widen and shift into the substrate. Scratch resistance of the oxygen implanted layer also was improved significantly. While the temperature increases to 650°C and 700°C, annealing induces a hardness valley value, which is even far lower than that of the substrate. At the same time, scratch resistance deteriorates for the oxygen implanted layer. All annealing samples have a higher elasticity recover than the implanted samples.

AB - Ti6Al4V was implanted by oxygen plasma based ion implantation at pulsed negative voltages of 50kV with a fluence of 4×1017 O/cm2. The implanting temperature of below 180°C was controlled by an oil cooling working table. Subsequent annealing was applied the implanted samples in vacuum at 600°C, 650°C and 700°C, respectively. The influence of annealing conditions on hardness and scratch resistance of the oxygen-implanted layer was investigated. The annealing at a lower temperature below 650°C makes the hardness peak widen and shift into the substrate. Scratch resistance of the oxygen implanted layer also was improved significantly. While the temperature increases to 650°C and 700°C, annealing induces a hardness valley value, which is even far lower than that of the substrate. At the same time, scratch resistance deteriorates for the oxygen implanted layer. All annealing samples have a higher elasticity recover than the implanted samples.

KW - Annealing

KW - Hardness

KW - Oxygen-implanted layer

KW - Scratch resistance

KW - Ti6Al4V

UR - https://www.scopus.com/pages/publications/84879799798

U2 - 10.1016/j.surfcoat.2012.06.001

DO - 10.1016/j.surfcoat.2012.06.001

M3 - 文章

AN - SCOPUS:84879799798

SN - 0257-8972

VL - 228

SP - S224-S227

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - SUPPL.1

ER -

Influence of annealing on mechanics behaviors of oxygen-implanted layer on Ti6Al4V by plasma-based ion implantation

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this