Indentation and scratch tests on sputtered amorphous CNX films deposited on plasma-nitrided Ti-6Al-4V

Yongqing Fu; Nee Lam Loh; Bibo Yan; Jun Wei

doi:10.1361/105994900770345610

Indentation and scratch tests on sputtered amorphous CN_X films deposited on plasma-nitrided Ti-6Al-4V

Yongqing Fu
, Nee Lam Loh
, Bibo Yan
, Jun Wei

Nanyang Technological University
Agency for Science, Technology and Research, Singapore

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

Sputtered carbon nitride (CN_X) films were deposited on both untreated and plasma-nitrided Ti-6Al-4V substrates. Surface and cross-section morphology of the deposited CN_X films was studied by scanning electron microscopy (SEM). Modified Vickers hardness tests showed that the intrinsic hardness of the CN_X film was about HV 2000 to 3000. Both the indentation and scratch tests showed that, compared with the CN_X film deposited on Ti-6Al-4V substrate, the load-bearing capacity of CN_X film deposited on a plasma-nitrided layer was improved dramatically. From the results of scratch tests, the duplex-treated system was effective in maintaining a favorable low and stable coefficient of friction and improving the wear resistance of Ti-6Al-4V substrate.

Original language	English
Pages (from-to)	499-505
Number of pages	7
Journal	Journal of Materials Engineering and Performance
Volume	9
Issue number	5
DOIs	https://doi.org/10.1361/105994900770345610
State	Published - Oct 2000
Externally published	Yes

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title = "Indentation and scratch tests on sputtered amorphous CNX films deposited on plasma-nitrided Ti-6Al-4V",

abstract = "Sputtered carbon nitride (CNX) films were deposited on both untreated and plasma-nitrided Ti-6Al-4V substrates. Surface and cross-section morphology of the deposited CNX films was studied by scanning electron microscopy (SEM). Modified Vickers hardness tests showed that the intrinsic hardness of the CNX film was about HV 2000 to 3000. Both the indentation and scratch tests showed that, compared with the CNX film deposited on Ti-6Al-4V substrate, the load-bearing capacity of CNX film deposited on a plasma-nitrided layer was improved dramatically. From the results of scratch tests, the duplex-treated system was effective in maintaining a favorable low and stable coefficient of friction and improving the wear resistance of Ti-6Al-4V substrate.",

author = "Yongqing Fu and Loh, \{Nee Lam\} and Bibo Yan and Jun Wei",

year = "2000",

month = oct,

doi = "10.1361/105994900770345610",

language = "英语",

volume = "9",

pages = "499--505",

journal = "Journal of Materials Engineering and Performance",

issn = "1059-9495",

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TY - JOUR

T1 - Indentation and scratch tests on sputtered amorphous CNX films deposited on plasma-nitrided Ti-6Al-4V

AU - Fu, Yongqing

AU - Loh, Nee Lam

AU - Yan, Bibo

AU - Wei, Jun

PY - 2000/10

Y1 - 2000/10

N2 - Sputtered carbon nitride (CNX) films were deposited on both untreated and plasma-nitrided Ti-6Al-4V substrates. Surface and cross-section morphology of the deposited CNX films was studied by scanning electron microscopy (SEM). Modified Vickers hardness tests showed that the intrinsic hardness of the CNX film was about HV 2000 to 3000. Both the indentation and scratch tests showed that, compared with the CNX film deposited on Ti-6Al-4V substrate, the load-bearing capacity of CNX film deposited on a plasma-nitrided layer was improved dramatically. From the results of scratch tests, the duplex-treated system was effective in maintaining a favorable low and stable coefficient of friction and improving the wear resistance of Ti-6Al-4V substrate.

AB - Sputtered carbon nitride (CNX) films were deposited on both untreated and plasma-nitrided Ti-6Al-4V substrates. Surface and cross-section morphology of the deposited CNX films was studied by scanning electron microscopy (SEM). Modified Vickers hardness tests showed that the intrinsic hardness of the CNX film was about HV 2000 to 3000. Both the indentation and scratch tests showed that, compared with the CNX film deposited on Ti-6Al-4V substrate, the load-bearing capacity of CNX film deposited on a plasma-nitrided layer was improved dramatically. From the results of scratch tests, the duplex-treated system was effective in maintaining a favorable low and stable coefficient of friction and improving the wear resistance of Ti-6Al-4V substrate.

UR - https://www.scopus.com/pages/publications/0034297550

U2 - 10.1361/105994900770345610

DO - 10.1361/105994900770345610

M3 - 文章

AN - SCOPUS:0034297550

SN - 1059-9495

VL - 9

SP - 499

EP - 505

JO - Journal of Materials Engineering and Performance

JF - Journal of Materials Engineering and Performance

IS - 5

ER -

Indentation and scratch tests on sputtered amorphous CN_X films deposited on plasma-nitrided Ti-6Al-4V

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