Impact on diffraction efficiency of binary optical elements for spot exposure superposing ratio

In fabrication of free form optical surfaces, spot exposure is a typical mode in laser photolithography. Proper selection of spot exposure superposing ratio is the key to optimize etching quality and writing speed. In this paper, a new composite diffractive grating structure is modeled for the influence on diffraction efficiency of binary optical elements caused by spot exposure superposing ratio. Composite grating can be transformed into one simple rectangular grating and two triangular gratings. Angular spectrum theory is used to describe the mathematical expression of the composite diffractive grating. Through simulation analysis, the relationships between diffraction efficiency and the other three items as grating depth, spot radius, and blaze wavelength, has been shown. Simulation results indicate that shape error caused by spot exposure ratio impact the diffraction efficiency greatly in deep etching, and the transmittance will reach maximal point approximately while spot exposure ratio is over 60%. This conclusion can be taken as the theoretical foundation for exposure frequency selection in laser photolithography figure generation.