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Impact of polishing process parameters on the low frequency surface accuracy of fused silica optics

  • Hongxiang Wang*
  • , Benwen Zhu
  • , Xianhua Chen
  • , Jing Hou
  • , Jinghe Wang
  • *Corresponding author for this work
  • Harbin Institute of Technology
  • China Academy of Engineering Physics

Research output: Contribution to journalArticlepeer-review

Abstract

Based on the relative motion of the workpiece and polishing dish, using the material removal model of fused silica optics, the influence of speed ratio and eccentricity on material removal function was analyzed, and the influence of polishing process parameters on the low frequency surface accuracy was studied by theoretical analysis and polishing experiments. Low frequency surface errors were detected using high-resolution detection equipment, preferred polishing process parameters were obtained, and the corresponding experiment was done for verification, an appropriate method was proposed to improve the low-frequency surface accuracy of fused silica optics in the polishing process.

Original languageEnglish
Article number042001
JournalQiangjiguang Yu Lizishu/High Power Laser and Particle Beams
Volume27
Issue number4
DOIs
StatePublished - 1 Apr 2015

Keywords

  • Fused silica optics
  • Polishing process
  • Process parameters
  • Surface accuracy
  • Surface quality

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