Abstract
In this work, the single-event burnout (SEB) and degradation behaviors induced by heavy-ion irradiation were investigated in an 80-V-rated SEB-hardened split-gate trench (SGT) power U-shaped metal-oxide-semiconductor field-effect transistor (UMOSFET). After SEB hardening, the SEB failure threshold voltage of the sample device was measured to be 90 V; furthermore, a permanent degradation of the drain leakage or gate leakage was found after irradiation when the reverse voltage exceeded 60 V. The simulation results demonstrate that the heavy-ion-induced transient high temperature is a common mechanism responsible for the severe degradation and the catastrophic SEB. In addition, an effective method to improve the degradation and SEB tolerances, which enhances the rated breakdown voltage of a device, was proven through simulations.
| Original language | English |
|---|---|
| Pages (from-to) | 664-668 |
| Number of pages | 5 |
| Journal | IEEE Transactions on Electron Devices |
| Volume | 69 |
| Issue number | 2 |
| DOIs | |
| State | Published - 1 Feb 2022 |
Keywords
- Degradation
- U-shaped metal-oxide-semiconductor field-effect transistor (UMOSFET)
- single-event burnout (SEB)
- split-gate trench (SGT)
- threshold voltage
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