Homogeneous surface oxidation and triangle patterning of monolayer MoS                         2                          by hydrogen peroxide

Cheng Yan Xu; Jing Kai Qin; Hang Yan; Yang Li; Wen Zhu Shao; Liang Zhen

doi:10.1016/j.apsusc.2018.05.025

Homogeneous surface oxidation and triangle patterning of monolayer MoS ₂ by hydrogen peroxide

Cheng Yan Xu
, Jing Kai Qin
, Hang Yan
, Yang Li
, Wen Zhu Shao
, Liang Zhen^*

^*Corresponding author for this work

Harbin Institute of Technology
Harbin Institute of Technology

Research output: Contribution to journal › Article › peer-review

32 Scopus citations

Abstract

Atomically thin monolayer molybdenum disulfides (MoS ₂ ) with tunable electronic structure has promising applications in opto-electronic devices and sensors. In this work, unique nano-patterning and surface oxidation of monolayer MoS ₂ was achieved based on hydrogen peroxide (H ₂ O ₂ ) treatment. It was found that the exfoliated monolayer MoS ₂ can be uniformly oxidized when exposed to low-concentration H ₂ O ₂ , forming an intermediate phase composed of MoS _x O _y . In addition, patterned triangular pits with well-defined edges can be formed under high-concentration H ₂ O ₂ condition. The band gap of monolayer MoS ₂ could be effectively modulated by H ₂ O ₂ treatment as verified by photoluminescence spectra. This work shows that simple H ₂ O ₂ treatment can be an alternative approach for both surface functionalization and band gap modulation of MoS ₂ flake, and it also provides an alternatively simple way to obtain patterned MoS ₂ nanostructures without complicated standard lithography processes.

Original language	English
Pages (from-to)	451-456
Number of pages	6
Journal	Applied Surface Science
Volume	452
DOIs	https://doi.org/10.1016/j.apsusc.2018.05.025
State	Published - 15 Sep 2018

Keywords

Atomic force microscopy
MoS
Patterning
Surface oxidation
Two-dimensional materials

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10.1016/j.apsusc.2018.05.025

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@article{45a3881435864db39050f93c44084472,

title = " Homogeneous surface oxidation and triangle patterning of monolayer MoS 2 by hydrogen peroxide ",

abstract = " Atomically thin monolayer molybdenum disulfides (MoS 2 ) with tunable electronic structure has promising applications in opto-electronic devices and sensors. In this work, unique nano-patterning and surface oxidation of monolayer MoS 2 was achieved based on hydrogen peroxide (H 2 O 2 ) treatment. It was found that the exfoliated monolayer MoS 2 can be uniformly oxidized when exposed to low-concentration H 2 O 2 , forming an intermediate phase composed of MoS x O y . In addition, patterned triangular pits with well-defined edges can be formed under high-concentration H 2 O 2 condition. The band gap of monolayer MoS 2 could be effectively modulated by H 2 O 2 treatment as verified by photoluminescence spectra. This work shows that simple H 2 O 2 treatment can be an alternative approach for both surface functionalization and band gap modulation of MoS 2 flake, and it also provides an alternatively simple way to obtain patterned MoS 2 nanostructures without complicated standard lithography processes.",

keywords = "Atomic force microscopy, MoS, Patterning, Surface oxidation, Two-dimensional materials",

author = "Xu, \{Cheng Yan\} and Qin, \{Jing Kai\} and Hang Yan and Yang Li and Shao, \{Wen Zhu\} and Liang Zhen",

note = "Publisher Copyright: {\textcopyright} 2018 Elsevier B.V.",

year = "2018",

month = sep,

day = "15",

doi = "10.1016/j.apsusc.2018.05.025",

language = "英语",

volume = "452",

pages = "451--456",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Homogeneous surface oxidation and triangle patterning of monolayer MoS 2 by hydrogen peroxide

AU - Xu, Cheng Yan

AU - Qin, Jing Kai

AU - Yan, Hang

AU - Li, Yang

AU - Shao, Wen Zhu

AU - Zhen, Liang

PY - 2018/9/15

Y1 - 2018/9/15

N2 - Atomically thin monolayer molybdenum disulfides (MoS 2 ) with tunable electronic structure has promising applications in opto-electronic devices and sensors. In this work, unique nano-patterning and surface oxidation of monolayer MoS 2 was achieved based on hydrogen peroxide (H 2 O 2 ) treatment. It was found that the exfoliated monolayer MoS 2 can be uniformly oxidized when exposed to low-concentration H 2 O 2 , forming an intermediate phase composed of MoS x O y . In addition, patterned triangular pits with well-defined edges can be formed under high-concentration H 2 O 2 condition. The band gap of monolayer MoS 2 could be effectively modulated by H 2 O 2 treatment as verified by photoluminescence spectra. This work shows that simple H 2 O 2 treatment can be an alternative approach for both surface functionalization and band gap modulation of MoS 2 flake, and it also provides an alternatively simple way to obtain patterned MoS 2 nanostructures without complicated standard lithography processes.

AB - Atomically thin monolayer molybdenum disulfides (MoS 2 ) with tunable electronic structure has promising applications in opto-electronic devices and sensors. In this work, unique nano-patterning and surface oxidation of monolayer MoS 2 was achieved based on hydrogen peroxide (H 2 O 2 ) treatment. It was found that the exfoliated monolayer MoS 2 can be uniformly oxidized when exposed to low-concentration H 2 O 2 , forming an intermediate phase composed of MoS x O y . In addition, patterned triangular pits with well-defined edges can be formed under high-concentration H 2 O 2 condition. The band gap of monolayer MoS 2 could be effectively modulated by H 2 O 2 treatment as verified by photoluminescence spectra. This work shows that simple H 2 O 2 treatment can be an alternative approach for both surface functionalization and band gap modulation of MoS 2 flake, and it also provides an alternatively simple way to obtain patterned MoS 2 nanostructures without complicated standard lithography processes.

KW - Atomic force microscopy

KW - MoS

KW - Patterning

KW - Surface oxidation

KW - Two-dimensional materials

UR - https://www.scopus.com/pages/publications/85048727316

U2 - 10.1016/j.apsusc.2018.05.025

DO - 10.1016/j.apsusc.2018.05.025

M3 - 文章

AN - SCOPUS:85048727316

SN - 0169-4332

VL - 452

SP - 451

EP - 456

JO - Applied Surface Science

JF - Applied Surface Science

ER -

Homogeneous surface oxidation and triangle patterning of monolayer MoS ₂ by hydrogen peroxide

Abstract

Keywords

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