HiPIMS 的放电特性及其对薄膜结构和性能的调控

The microstructure and properties of deposited films are strongly affected the plasma density and ionization rate during magnetron sputtering. High-power impulse magnetron sputtering (HiPIMS) are attracted extensive research and attention due to its advantages of high ionization rate of sputtering particles. In order to explore the cause and process of high ionization rate of HiPIMS and grasp the regulation rules of high power pulsed magnetron sputtering technology on the microstructure and properties of thin films, the origin of HiPIMS high ionization rate and its technical advantages compared with DC magnetron sputtering are analyzed based on the general principle of magnetron sputtering technology. The macroscopic discharge characteristics and microscopic plasma characteristics of HiPIMS are summarized emphatically. Next, the application research of HiPIMS in the field of hard and transparent conductive films in recent years is summarized, and the influence of HiPIMS on the microscopic crystal structure of thin films and its regulation rules and advantages on the mechanical and photoelectric properties of thin films are clarified. The unique plasma-target interaction of HiPIMS can effectively improve the crystallization characteristics of thin films and realize the controllable regulation of photoelectrical properties.