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HiPIMS 电源的设计基础及研究进展

Translated title of the contribution: Design Basis and Research Progress of HiPIMS Power Supply
  • Chunzhi Gong
  • , Houpu Wu
  • , Tianshi Hu
  • , Xiubo Tian*
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

As the core component of high power magnetron sputtering (HiPIMS) technology, HiPIMS power supply largely determines the research progress and application potential of HiPIMS technology. On the whole, the research on HiPIMS power supply can be divided into three parts: the research of AC-DC power converter, DC-DC power converter and HiPIMS plasma power load. Among them, the power converter is the DC power supply end of HiPIMS power supply, and its technical characteristics depend on the common technology of pulse power supply, while the power load part interacts with the discharge mode of HiPIMS. On the basis of summarizing the research status of the core technologies of pulse power supply: high dynamic response, low input current ripple, high voltage gain and high performance power correction factor. The research status of pulse power load design based on HiPIMS discharge characteristics are summarized, and finally the key problems to be solved in HiPIMS power supply is discussed, it is expected to provide some reference for the further development of HiPIMS.

Translated title of the contributionDesign Basis and Research Progress of HiPIMS Power Supply
Original languageChinese (Traditional)
Pages (from-to)1-9
Number of pages9
JournalZhongguo Biaomian Gongcheng/China Surface Engineering
Volume35
Issue number5
DOIs
StatePublished - Oct 2022

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