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Growth of Czochralski silicon under magnetic field

  • Yuesheng Xu*
  • , Caichi Liu
  • , Haiyun Wang
  • , Weilian Zhang
  • , Qingxin Yang
  • , Yangxian Li
  • , Binyan Ren
  • , Fugui Liu
  • *Corresponding author for this work
  • Hebei University of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

Growth of Czochralski (CZ) silicon crystals under the magnetic field induced by a cusp-shaped permanent magnet of NdFeB has been investigated. It is found that the mass transport in silicon melt was controlled by its diffusion while the magnetic intensity at the edge of a crucible was over 0.15 T. In comparison with the growth of conventional CZ silicon without magnetic field, the resistivity homogeneity of the CZ silicon under the magnetic field was improved. Furthermore, the Marangoni convection which has a significant influence on the control of oxygen concentration was observed on the surface of silicon melt. It is suggested that the crystal growth mechanism in magnetic field was similar to that in micro-gravity if a critical value was reached, named the growth of equivalent micro-gravity. The relationship of the equivalent micro-gravity and the magnetic intensity was derived as g=(V0/V eff)g0. Finally, the orders of the equivalent micro-gravity corresponding to two crucibles with characteristic sizes were calculated. Copyright by Science in China Press 2004.

Original languageEnglish
Pages (from-to)281-292
Number of pages12
JournalScience in China, Series E: Technological Sciences
Volume47
Issue number3
DOIs
StatePublished - Jun 2004
Externally publishedYes

Keywords

  • Diffusion-controlled mechanism
  • Equivalent micro-gravity
  • Magnetic field
  • Marangoni convection

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