Skip to main navigation Skip to search Skip to main content

Growth and structure of aligned B-C-N nanotubes

  • J. Yu*
  • , Q. Zhang
  • , J. Ahn
  • , S. F. Yoon
  • , Rusli
  • , B. Gan
  • , K. Chew
  • , K. H. Tan
  • , X. D. Bai
  • , E. G. Wang
  • *Corresponding author for this work
  • National Institute for Materials Science Tsukuba
  • Nanyang Technological University
  • CAS - Institute of Physics

Research output: Contribution to journalConference articlepeer-review

Abstract

A study of growth and structure of aligned B-C-N nanotubes prepared using bias assisted chemical vapor deposition was discussed. The polycrystalline nickle wafers which act as catalysts were used as substrates. The results showed that an important role is played by the discharge current on the aligned growth of the nanotubes. The area density of nanotubes was found to increase with an increase in the discharge current.

Original languageEnglish
Pages (from-to)671-674
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume19
Issue number3
DOIs
StatePublished - May 2001
Externally publishedYes
Event13th International Vaccum Microelectronics Conference - Guangzhou, China
Duration: 14 Aug 200017 Aug 2000

Fingerprint

Dive into the research topics of 'Growth and structure of aligned B-C-N nanotubes'. Together they form a unique fingerprint.

Cite this