Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering - plasma immersion ion implantation and deposition (HPPMS-PIII&D)

Zhongzhen Wu; Xiubo Tian; Yongqiang Wei; Chunzhi Gong; Shiqin Yang; Feng Pan; Paul K. Chu

doi:10.1016/j.surfcoat.2013.10.007

Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering - plasma immersion ion implantation and deposition (HPPMS-PIII&D)

Zhongzhen Wu
, Xiubo Tian^*
, Yongqiang Wei
, Chunzhi Gong
, Shiqin Yang
, Feng Pan
, Paul K. Chu

^*Corresponding author for this work

School of Materials Science and Engineering

Harbin Institute of Technology
Peking University
City University of Hong Kong

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

A nanostructured interfacial layer with a graded structure is produced by hybrid high-power pulsed magnetron sputtering-plasma immersion ion implantation and deposition (HPPMS-PIII&D) to improve adhesion of multi-functional coatings. As a demonstration, a ceramic CrN film is prepared on stainless steel together with a Cr interlayer. High-resolution transmission electron microscopy (HR-TEM) reveals the presence of a 40. nm thick nanostructured interfacial layer between the Cr interlayer and substrate with gradually changing compositions, and this layer which possesses a dense and pore/void free structure is responsible for the strong film adhesion. The hybrid technology combines the benefits of both the HPPMS and PIII&D enabling fabrication of functional films with the desired properties. The technique and fabrication strategy have many potential applications in photovoltaics, energy storage, tribology, lubrication, aeronautics, and astronautics.

Original language	English
Pages (from-to)	320-325
Number of pages	6
Journal	Surface and Coatings Technology
Volume	236
DOIs	https://doi.org/10.1016/j.surfcoat.2013.10.007
State	Published - 15 Dec 2013

Keywords

CrN layer
High-power pulsed magnetron sputtering
Interface
Plasma immersion ion implantation and deposition
Stress

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10.1016/j.surfcoat.2013.10.007

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title = "Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering - plasma immersion ion implantation and deposition (HPPMS-PIII\&D)",

abstract = "A nanostructured interfacial layer with a graded structure is produced by hybrid high-power pulsed magnetron sputtering-plasma immersion ion implantation and deposition (HPPMS-PIII\&D) to improve adhesion of multi-functional coatings. As a demonstration, a ceramic CrN film is prepared on stainless steel together with a Cr interlayer. High-resolution transmission electron microscopy (HR-TEM) reveals the presence of a 40. nm thick nanostructured interfacial layer between the Cr interlayer and substrate with gradually changing compositions, and this layer which possesses a dense and pore/void free structure is responsible for the strong film adhesion. The hybrid technology combines the benefits of both the HPPMS and PIII\&D enabling fabrication of functional films with the desired properties. The technique and fabrication strategy have many potential applications in photovoltaics, energy storage, tribology, lubrication, aeronautics, and astronautics.",

keywords = "CrN layer, High-power pulsed magnetron sputtering, Interface, Plasma immersion ion implantation and deposition, Stress",

author = "Zhongzhen Wu and Xiubo Tian and Yongqiang Wei and Chunzhi Gong and Shiqin Yang and Feng Pan and Chu, \{Paul K.\}",

year = "2013",

month = dec,

day = "15",

doi = "10.1016/j.surfcoat.2013.10.007",

language = "英语",

volume = "236",

pages = "320--325",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

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TY - JOUR

T1 - Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering - plasma immersion ion implantation and deposition (HPPMS-PIII&D)

AU - Wu, Zhongzhen

AU - Tian, Xiubo

AU - Wei, Yongqiang

AU - Gong, Chunzhi

AU - Yang, Shiqin

AU - Pan, Feng

AU - Chu, Paul K.

PY - 2013/12/15

Y1 - 2013/12/15

N2 - A nanostructured interfacial layer with a graded structure is produced by hybrid high-power pulsed magnetron sputtering-plasma immersion ion implantation and deposition (HPPMS-PIII&D) to improve adhesion of multi-functional coatings. As a demonstration, a ceramic CrN film is prepared on stainless steel together with a Cr interlayer. High-resolution transmission electron microscopy (HR-TEM) reveals the presence of a 40. nm thick nanostructured interfacial layer between the Cr interlayer and substrate with gradually changing compositions, and this layer which possesses a dense and pore/void free structure is responsible for the strong film adhesion. The hybrid technology combines the benefits of both the HPPMS and PIII&D enabling fabrication of functional films with the desired properties. The technique and fabrication strategy have many potential applications in photovoltaics, energy storage, tribology, lubrication, aeronautics, and astronautics.

AB - A nanostructured interfacial layer with a graded structure is produced by hybrid high-power pulsed magnetron sputtering-plasma immersion ion implantation and deposition (HPPMS-PIII&D) to improve adhesion of multi-functional coatings. As a demonstration, a ceramic CrN film is prepared on stainless steel together with a Cr interlayer. High-resolution transmission electron microscopy (HR-TEM) reveals the presence of a 40. nm thick nanostructured interfacial layer between the Cr interlayer and substrate with gradually changing compositions, and this layer which possesses a dense and pore/void free structure is responsible for the strong film adhesion. The hybrid technology combines the benefits of both the HPPMS and PIII&D enabling fabrication of functional films with the desired properties. The technique and fabrication strategy have many potential applications in photovoltaics, energy storage, tribology, lubrication, aeronautics, and astronautics.

KW - CrN layer

KW - High-power pulsed magnetron sputtering

KW - Interface

KW - Plasma immersion ion implantation and deposition

KW - Stress

UR - https://www.scopus.com/pages/publications/84888822964

U2 - 10.1016/j.surfcoat.2013.10.007

DO - 10.1016/j.surfcoat.2013.10.007

M3 - 文章

AN - SCOPUS:84888822964

SN - 0257-8972

VL - 236

SP - 320

EP - 325

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -

Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering - plasma immersion ion implantation and deposition (HPPMS-PIII&D)

Abstract

Keywords

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