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Fundamentals of vacuum physics

  • Beijing Union University
  • Harbin Institute of Technology

Research output: Chapter in Book/Report/Conference proceedingChapterpeer-review

Abstract

Because ion plating technology is applied mainly in low-pressure gas discharge, it may be helpful first to introduce the fundamentals of vacuum physics related to low pressure. Therefore this chapter consists of the following parts: the concept of vacuum, the movement rule of gas molecules in a vacuum environment, the interaction between gas molecules and solid surfaces, and the electron emission on the cathode surface. The critical parts are the energy exchange of collisions between gas molecules, the rule of electron overflow at the interface of solid and vacuum, the characteristics of thermionic emission and cold field emission, and the characteristics of secondary electron emission by electron bombardment and ion bombardment of the metal surface.

Original languageEnglish
Title of host publicationModern Ion Plating Technology
Subtitle of host publicationFundamentals and Applications
PublisherElsevier
Pages9-28
Number of pages20
ISBN (Electronic)9780323908337
ISBN (Print)9780323908344
DOIs
StatePublished - 1 Jan 2023
Externally publishedYes

Keywords

  • Vacuum physics
  • adsorption
  • cold field emission
  • desorption
  • mean free path
  • secondary electron emission
  • thermionic emission
  • vacuum degree

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