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Formation of nanostructured metallic glass thin films upon sputtering

  • Sergey V. Ketov*
  • , Rastko Joksimovic
  • , Guoqiang Xie
  • , Artem Trifonov
  • , Kazue Kurihara
  • , Dmitri V. Louzguine-Luzgin
  • *Corresponding author for this work
  • Tohoku University
  • Lomonosov Moscow State University
  • National University of Science and Technology "MISiS"

Research output: Contribution to journalArticlepeer-review

Abstract

Morphology evolution of the multicomponent metallic glass film obtained by radio frequency (RF) magnetron sputtering was investigated in the present work. Two modes of metallic glass sputtering were distinguished: smooth film mode and clustered film mode. The sputtering parameters, which have the most influence on the sputtering modes, were determined. As a result, amorphous Ni-Nb thin films with a smooth surface and nanoglassy structure were deposited on silica float glass and Si substrates. The phase composition of the target appeared to have a significant influence on the chemical composition of the deposited amorphous thin film. The differences in charge transport and nanomechanical properties between the smooth and nanoglassy Ni-Nb film were also determined.

Original languageEnglish
Article numbere00228
JournalHeliyon
Volume3
Issue number1
DOIs
StatePublished - 1 Jan 2017
Externally publishedYes

Keywords

  • Engineering
  • Materials science
  • Nanotechnology

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