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Field emission from patterned carbon nanotube emitters produced by microwave plasma chemical vapor deposition

  • J. Yu*
  • , Q. Zhang
  • , J. Ahn
  • , S. F. Yoon
  • , Rusli
  • , Y. J. Li
  • , B. Gan
  • , K. Chew
  • , K. H. Tan
  • *Corresponding author for this work
  • National Institute for Materials Science Tsukuba
  • Nanyang Technological University

Research output: Contribution to journalArticlepeer-review

Abstract

Large area carbon nanotube patterns were fabricated by microwave plasma chemical vapor deposition. The carbon nanotubes were grown on pre-patterned catalyst films. Scanning electron microscopy and Raman spectroscopy were used to characterize the structure of the carbon nanotubes. The carbon nanotubes were very uniform and approximately 100 nm in diameter. The Raman spectrum shows a good graphitization for the carbon nanotubes. Aligned growth was found on the pattern line area. Field emission characteristics of the patterns were characterized. A threshold field of 2.0 V / μm and emission current density of 1.1 mA/cm2 at 3.6 V / μm were achieved. A clear and stable image showing the patterns were obtained.

Original languageEnglish
Pages (from-to)2157-2160
Number of pages4
JournalDiamond and Related Materials
Volume10
Issue number12
DOIs
StatePublished - Dec 2001
Externally publishedYes

Keywords

  • Carbon nanotubes
  • Field emission
  • Microwave plasma CVD
  • Patterns

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