Fabrication of split-ring resonators by tilted nanoimprint lithography

Liguo Gao; Li Lin; Juanyuan Hao; Weifeng Wang; Renping Ma; Hongbo Xu; Jingsheng Yu; Nan Lu; Wenchong Wang; Lifeng Chi

doi:10.1016/j.jcis.2011.04.086

Fabrication of split-ring resonators by tilted nanoimprint lithography

Liguo Gao
, Li Lin
, Juanyuan Hao
, Weifeng Wang
, Renping Ma
, Hongbo Xu
, Jingsheng Yu
, Nan Lu^*
, Wenchong Wang
, Lifeng Chi

^*Corresponding author for this work

Jilin University
University of Münster

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

An efficient fabrication technique for large area periodic metallic split-ring arrays has been demonstrated by the combination of tilted nanoimprint lithography and nanotransfer imprinting. The feature size of the split-rings can be adjusted by varying the key geometry parameters of the original imprinting mold. Due to the flexible nature of PDMS molds, these arrays can be patterned on curved surfaces. The molds for nanoimprint lithography and nanotransfer imprinting can be used multiple times without a loss of fidelity.

Original language	English
Pages (from-to)	320-323
Number of pages	4
Journal	Journal of Colloid and Interface Science
Volume	360
Issue number	1
DOIs	https://doi.org/10.1016/j.jcis.2011.04.086
State	Published - 1 Aug 2011
Externally published	Yes

Keywords

Nanotransfer printing
Negative-index material
Reactive ion etching
Split-ring resonator
Tilted nanoimprint lithography

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10.1016/j.jcis.2011.04.086

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title = "Fabrication of split-ring resonators by tilted nanoimprint lithography",

abstract = "An efficient fabrication technique for large area periodic metallic split-ring arrays has been demonstrated by the combination of tilted nanoimprint lithography and nanotransfer imprinting. The feature size of the split-rings can be adjusted by varying the key geometry parameters of the original imprinting mold. Due to the flexible nature of PDMS molds, these arrays can be patterned on curved surfaces. The molds for nanoimprint lithography and nanotransfer imprinting can be used multiple times without a loss of fidelity.",

keywords = "Nanotransfer printing, Negative-index material, Reactive ion etching, Split-ring resonator, Tilted nanoimprint lithography",

author = "Liguo Gao and Li Lin and Juanyuan Hao and Weifeng Wang and Renping Ma and Hongbo Xu and Jingsheng Yu and Nan Lu and Wenchong Wang and Lifeng Chi",

year = "2011",

month = aug,

day = "1",

doi = "10.1016/j.jcis.2011.04.086",

language = "英语",

volume = "360",

pages = "320--323",

journal = "Journal of Colloid and Interface Science",

issn = "0021-9797",

publisher = "Academic Press Inc.",

number = "1",

}

TY - JOUR

T1 - Fabrication of split-ring resonators by tilted nanoimprint lithography

AU - Gao, Liguo

AU - Lin, Li

AU - Hao, Juanyuan

AU - Wang, Weifeng

AU - Ma, Renping

AU - Xu, Hongbo

AU - Yu, Jingsheng

AU - Lu, Nan

AU - Wang, Wenchong

AU - Chi, Lifeng

PY - 2011/8/1

Y1 - 2011/8/1

N2 - An efficient fabrication technique for large area periodic metallic split-ring arrays has been demonstrated by the combination of tilted nanoimprint lithography and nanotransfer imprinting. The feature size of the split-rings can be adjusted by varying the key geometry parameters of the original imprinting mold. Due to the flexible nature of PDMS molds, these arrays can be patterned on curved surfaces. The molds for nanoimprint lithography and nanotransfer imprinting can be used multiple times without a loss of fidelity.

AB - An efficient fabrication technique for large area periodic metallic split-ring arrays has been demonstrated by the combination of tilted nanoimprint lithography and nanotransfer imprinting. The feature size of the split-rings can be adjusted by varying the key geometry parameters of the original imprinting mold. Due to the flexible nature of PDMS molds, these arrays can be patterned on curved surfaces. The molds for nanoimprint lithography and nanotransfer imprinting can be used multiple times without a loss of fidelity.

KW - Nanotransfer printing

KW - Negative-index material

KW - Reactive ion etching

KW - Split-ring resonator

KW - Tilted nanoimprint lithography

UR - https://www.scopus.com/pages/publications/79957846062

U2 - 10.1016/j.jcis.2011.04.086

DO - 10.1016/j.jcis.2011.04.086

M3 - 文章

AN - SCOPUS:79957846062

SN - 0021-9797

VL - 360

SP - 320

EP - 323

JO - Journal of Colloid and Interface Science

JF - Journal of Colloid and Interface Science

IS - 1

ER -

Fabrication of split-ring resonators by tilted nanoimprint lithography

Abstract

Keywords

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