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Fabrication and surface properties of ZrN films by high power pulsed magnetron sputtering

  • Zhongzhen Wu
  • , Xiubo Tian*
  • , Weizan Duan
  • , Chunzhi Gong
  • , Shiqin Yang
  • *Corresponding author for this work
  • Harbin Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

ZrN nano-films were prepared by high power pulsed magnetron sputtering technique (HPPMS) under the different work pressures. SEM and XRD were used to investigate the surface morphologies and the phase structure of the films. The results show that the surface of the prepared ZrN films was smooth and dense, and they have no any macroparticles. The grains of the films grow under the preferred orientations of ZrN (111) and ZrN (220), and show the combined texture with several preferred orientations. The films have very high hardness of 33.1 GPa and lower friction coefficient of 0.2. Corrosion resistance has been improved with an increase of the corrosion potential by 0.28 V and a decrease of corrosion current by a factor of 5. The samples fabricated at low work pressure possess a better surface properties, but the surface hardness, wear-resistance and corrosion resistance show a decrease at high gas pressure due to more frequent particle collisions.

Original languageEnglish
Pages (from-to)561-566
Number of pages6
JournalCailiao Yanjiu Xuebao/Chinese Journal of Materials Research
Volume24
Issue number6
StatePublished - Dec 2010

Keywords

  • High power pulsed magnetron sputtering
  • Micro-structure
  • Surface and interface in the materials
  • Surface properties
  • ZrN

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