Abstract
Abstract Novel turbostratic BN thin films have been fabricated via a facile chemical vapor deposition route on SiO2/Si substrates. The BN thin film grew continuously on the entire SiO2/Si surface and the region with uniform thickness (∼150 nm) can be up to several centimeters in lateral size which is only limited by the size of the substrate. The thin film exhibited a novel turbostratic graphite-like structure. Moreover, the micro-Raman spectrum of the thin film was found unexpectedly broadened and blue-shifted relative to that of the bulk hexagonal BN. The reason for the peculiar Raman scattering behavior of the turbostratic BN thin films was briefly discussed.
| Original language | English |
|---|---|
| Article number | 18651 |
| Pages (from-to) | 130-133 |
| Number of pages | 4 |
| Journal | Materials Letters |
| Volume | 151 |
| DOIs | |
| State | Published - 15 Jul 2015 |
| Externally published | Yes |
Keywords
- Ceramics
- Chemical vapor deposition
- Raman scattering behavior
- Thin films
- Turbostratic BN film
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