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Fabrication and Raman scattering behavior of novel turbostratic BN thin films

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Abstract

Abstract Novel turbostratic BN thin films have been fabricated via a facile chemical vapor deposition route on SiO2/Si substrates. The BN thin film grew continuously on the entire SiO2/Si surface and the region with uniform thickness (∼150 nm) can be up to several centimeters in lateral size which is only limited by the size of the substrate. The thin film exhibited a novel turbostratic graphite-like structure. Moreover, the micro-Raman spectrum of the thin film was found unexpectedly broadened and blue-shifted relative to that of the bulk hexagonal BN. The reason for the peculiar Raman scattering behavior of the turbostratic BN thin films was briefly discussed.

Original languageEnglish
Article number18651
Pages (from-to)130-133
Number of pages4
JournalMaterials Letters
Volume151
DOIs
StatePublished - 15 Jul 2015
Externally publishedYes

Keywords

  • Ceramics
  • Chemical vapor deposition
  • Raman scattering behavior
  • Thin films
  • Turbostratic BN film

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