Fabrication and characterization of self-standing W-Nanodendrites on insulator SiO₂ substrate by electron-beam-induced deposition under HVTEM

Self-standing W-nanodendrite structures were fabricated on an insulator SiO₂ substrate by electron-beam-induced deposition under a 1000 kV high-voltage transmission electron microscope (HVTEM). The growth process and as-fabricated structures were characterized by conventional and high-resolution transmission electron microscopies (CTEM and HRTEM) and X-ray energy dispersive spectroscopy (EDS). The nucleation and growth of nanodendrite structures are attributed to a mechanism involving charge-up produced on the substrate surface, and the movement of charges to and charge accumulation at the convex surface of the substrate as well as the tips of the deposits. The as-fabricated nanodendrite structures possess a high crystallinity and a high content of tungsten. The structures consist of many nanometer-scale body-centered cubic (bcc) W crystals.