Fabrication and characterization of self-standing W-nanodendrites on insulator SiO2 substrate with electron-beam-induced deposition in HVTEM

Guoqiang Xie; Minghui Song; Kazutaka Mitsuishi; Kazuo Furuya

Fabrication and characterization of self-standing W-nanodendrites on insulator SiO₂ substrate with electron-beam-induced deposition in HVTEM

Guoqiang Xie^*
, Minghui Song
, Kazutaka Mitsuishi
, Kazuo Furuya

^*Corresponding author for this work

National Institute for Materials Science Tsukuba

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

Self-standing W-nanodendrite structures were fabricated on an insulator SiO₂ substrate using an electron-beam-induced deposition process in a high voltage transmission electron microscope (HVTEM). Its growth process and microstructure were investigated using conventional and high-resolution transmission electron microscopy (CTEM and HRTEM) and X-ray energy dispersive spectroscopy (EDS). The fabricated structures were observed and analyzed in situ or after the fabrication using a JEM-ARM1000 TEM and and EDS attached to a JEM-2010F TEM. It was found that the dendrite structures grow only in the area of electron beam irradiation and the area can be controlled with controlling the electron beam.

Original language	English
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 2004
Pages	142-143
Number of pages	2
State	Published - 2004
Externally published	Yes
Event	2004 International Microprocesses and Nanotechnology Conference - Osaka, Japan Duration: 26 Oct 2004 → 29 Oct 2004

Publication series

Name	Digest of Papers - Microprocesses and Nanotechnology 2004

Conference

Conference	2004 International Microprocesses and Nanotechnology Conference
Country/Territory	Japan
City	Osaka
Period	26/10/04 → 29/10/04

Cite this

@inproceedings{a0c50511703a4c6b9b0045ba42277171,

title = "Fabrication and characterization of self-standing W-nanodendrites on insulator SiO2 substrate with electron-beam-induced deposition in HVTEM",

abstract = "Self-standing W-nanodendrite structures were fabricated on an insulator SiO2 substrate using an electron-beam-induced deposition process in a high voltage transmission electron microscope (HVTEM). Its growth process and microstructure were investigated using conventional and high-resolution transmission electron microscopy (CTEM and HRTEM) and X-ray energy dispersive spectroscopy (EDS). The fabricated structures were observed and analyzed in situ or after the fabrication using a JEM-ARM1000 TEM and and EDS attached to a JEM-2010F TEM. It was found that the dendrite structures grow only in the area of electron beam irradiation and the area can be controlled with controlling the electron beam.",

author = "Guoqiang Xie and Minghui Song and Kazutaka Mitsuishi and Kazuo Furuya",

year = "2004",

language = "英语",

isbn = "4990247205",

series = "Digest of Papers - Microprocesses and Nanotechnology 2004",

pages = "142--143",

booktitle = "Digest of Papers - Microprocesses and Nanotechnology 2004",

note = "2004 International Microprocesses and Nanotechnology Conference ; Conference date: 26-10-2004 Through 29-10-2004",

}

Xie, G, Song, M, Mitsuishi, K & Furuya, K 2004, Fabrication and characterization of self-standing W-nanodendrites on insulator SiO₂ substrate with electron-beam-induced deposition in HVTEM. in Digest of Papers - Microprocesses and Nanotechnology 2004. Digest of Papers - Microprocesses and Nanotechnology 2004, pp. 142-143, 2004 International Microprocesses and Nanotechnology Conference, Osaka, Japan, 26/10/04.

Fabrication and characterization of self-standing W-nanodendrites on insulator SiO₂ substrate with electron-beam-induced deposition in HVTEM. / Xie, Guoqiang; Song, Minghui; Mitsuishi, Kazutaka et al.
Digest of Papers - Microprocesses and Nanotechnology 2004. 2004. p. 142-143 (Digest of Papers - Microprocesses and Nanotechnology 2004).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Fabrication and characterization of self-standing W-nanodendrites on insulator SiO2 substrate with electron-beam-induced deposition in HVTEM

AU - Xie, Guoqiang

AU - Song, Minghui

AU - Mitsuishi, Kazutaka

AU - Furuya, Kazuo

PY - 2004

Y1 - 2004

N2 - Self-standing W-nanodendrite structures were fabricated on an insulator SiO2 substrate using an electron-beam-induced deposition process in a high voltage transmission electron microscope (HVTEM). Its growth process and microstructure were investigated using conventional and high-resolution transmission electron microscopy (CTEM and HRTEM) and X-ray energy dispersive spectroscopy (EDS). The fabricated structures were observed and analyzed in situ or after the fabrication using a JEM-ARM1000 TEM and and EDS attached to a JEM-2010F TEM. It was found that the dendrite structures grow only in the area of electron beam irradiation and the area can be controlled with controlling the electron beam.

AB - Self-standing W-nanodendrite structures were fabricated on an insulator SiO2 substrate using an electron-beam-induced deposition process in a high voltage transmission electron microscope (HVTEM). Its growth process and microstructure were investigated using conventional and high-resolution transmission electron microscopy (CTEM and HRTEM) and X-ray energy dispersive spectroscopy (EDS). The fabricated structures were observed and analyzed in situ or after the fabrication using a JEM-ARM1000 TEM and and EDS attached to a JEM-2010F TEM. It was found that the dendrite structures grow only in the area of electron beam irradiation and the area can be controlled with controlling the electron beam.

UR - https://www.scopus.com/pages/publications/23244434891

M3 - 会议稿件

AN - SCOPUS:23244434891

SN - 4990247205

T3 - Digest of Papers - Microprocesses and Nanotechnology 2004

SP - 142

EP - 143

BT - Digest of Papers - Microprocesses and Nanotechnology 2004

T2 - 2004 International Microprocesses and Nanotechnology Conference

Y2 - 26 October 2004 through 29 October 2004

ER -

Fabrication and characterization of self-standing W-nanodendrites on insulator SiO₂ substrate with electron-beam-induced deposition in HVTEM

Abstract

Publication series

Conference

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