Abstract
The prototype equipment for nano-particle colloid hydrodynamic cavitation jet polishing (HCJP) was prepared and the polishing experiment of HCJP to process single crystal silicon was conducted. The experiment results indicated that, in both cases of HCJP polishing and common jet polishing, the processed area presented an orbicular structure of "W" shape when the angle of jet was 90° to the horizon. The position that had the best surface quality was located on the annulus of processing region where the most material was removed. Compared with common jet polishing, HCJP had higher polishing efficiency and a better polished surface quality. In the present experiment of HCJP, a supersmooth surface of single crystal silicon of R a 0.758 nm was obtained.
| Original language | English |
|---|---|
| Pages (from-to) | 22-26 |
| Number of pages | 5 |
| Journal | Jingangshi yu Moliao Moju Gongcheng/Diamond and Abrasives Engineering |
| Volume | 32 |
| Issue number | 4 |
| State | Published - Aug 2012 |
| Externally published | Yes |
Keywords
- Hydrodynamic cavitation jet polishing
- Nanoparticle colloid
- Roughness
- Supersmooth surface
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