TY - GEN
T1 - EWMA controller tuning and performance evaluation in a high mixed system
AU - Ma, Mingda
AU - Chang, Chun Cheng
AU - Wong, David S.H.
AU - Jang, Shi Shang
PY - 2008
Y1 - 2008
N2 - The exponentially weighted moving average (EWMA) controller is a very popular run-to-run (RtR) control scheme in semiconductor industry. However, in any typical step of semiconductor process, many different products are produced on parallel tools. RtR control is usually implemented with a "threaded" control framework, i.e.: different controllers are used for different combinations of tools and products. In this paper, the problem of EWMA controller tuning and performance evaluation in a mixed product system is investigated by simulation and time series analysis. It was found that as the product frequency changed, the tuning guidelines of a threaded EWMA controller were different for different types of tool disturbances. For a stationary ARMA(1,1) noise, the tuning parameter should be increased as product frequency decreases. If the tool exhibits non-stationary tool dynamics, e.g. ARIMA(1,1,1) noise, the tuning parameter should increase as the product frequency decreases.
AB - The exponentially weighted moving average (EWMA) controller is a very popular run-to-run (RtR) control scheme in semiconductor industry. However, in any typical step of semiconductor process, many different products are produced on parallel tools. RtR control is usually implemented with a "threaded" control framework, i.e.: different controllers are used for different combinations of tools and products. In this paper, the problem of EWMA controller tuning and performance evaluation in a mixed product system is investigated by simulation and time series analysis. It was found that as the product frequency changed, the tuning guidelines of a threaded EWMA controller were different for different types of tool disturbances. For a stationary ARMA(1,1) noise, the tuning parameter should be increased as product frequency decreases. If the tool exhibits non-stationary tool dynamics, e.g. ARIMA(1,1,1) noise, the tuning parameter should increase as the product frequency decreases.
KW - Applications in semiconductor manufacturing
KW - Industrial applications of process control
KW - Monitoring and performance assessment
UR - https://www.scopus.com/pages/publications/79961019960
U2 - 10.3182/20080706-5-KR-1001.1162
DO - 10.3182/20080706-5-KR-1001.1162
M3 - 会议稿件
AN - SCOPUS:79961019960
SN - 9783902661005
T3 - IFAC Proceedings Volumes (IFAC-PapersOnline)
BT - Proceedings of the 17th World Congress, International Federation of Automatic Control, IFAC
T2 - 17th World Congress, International Federation of Automatic Control, IFAC
Y2 - 6 July 2008 through 11 July 2008
ER -