Enhancement of discharge and deposition rate in dual-pulse pulsed magnetron sputtering: Effect of ignition pulse width

Houpu Wu; Qinwen Tian; Xiubo Tian; Chunzhi Gong; Xinyu Zhang; Zhongzhen Wu

doi:10.1016/j.surfcoat.2019.06.016

Enhancement of discharge and deposition rate in dual-pulse pulsed magnetron sputtering: Effect of ignition pulse width

Houpu Wu
, Qinwen Tian
, Xiubo Tian^*
, Chunzhi Gong
, Xinyu Zhang
, Zhongzhen Wu

^*Corresponding author for this work

School of Materials Science and Engineering

Harbin Institute of Technology
Harbin Institute of Technology
Peking University

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

To increase deposition rate during pulsed magnetron sputtering (PMS), a novel dual-pulse pulsed magnetron sputtering (DP-PMS) was proposed. The discharge mode of DP-PMS firstly produced a pulsed high ignition voltage with short duration followed by a subsequent pulsed low work voltage with long duration. CrN coatings were deposited by DP-PMS and PMS. The effect of ignition pulse width of DP-PMS on the discharge of Cr target in argon and the deposition rate of CrN coatings was explored. The target current of DP-PMS was featured by an initial peak, which was different from the triangular waveform in PMS. The DP-PMS with a longer ignition pulse produced a higher substrate current and a larger number of Cr⁰ at unit target power. There existed a proper width of initial ignition pulse (e.g. 15 us) producing the maximum deposition rate at unit target power, which was nearly four times higher than that of PMS.

Original language	English
Pages (from-to)	383-392
Number of pages	10
Journal	Surface and Coatings Technology
Volume	374
DOIs	https://doi.org/10.1016/j.surfcoat.2019.06.016
State	Published - 25 Sep 2019

Keywords

CrN coating
Deposition rate
Dual-pulse pulsed magnetron sputtering
Ignition pulse
Pulse width

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10.1016/j.surfcoat.2019.06.016

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@article{9b98e8b517d3464a9881f9ae89dacdc8,

title = "Enhancement of discharge and deposition rate in dual-pulse pulsed magnetron sputtering: Effect of ignition pulse width",

abstract = "To increase deposition rate during pulsed magnetron sputtering (PMS), a novel dual-pulse pulsed magnetron sputtering (DP-PMS) was proposed. The discharge mode of DP-PMS firstly produced a pulsed high ignition voltage with short duration followed by a subsequent pulsed low work voltage with long duration. CrN coatings were deposited by DP-PMS and PMS. The effect of ignition pulse width of DP-PMS on the discharge of Cr target in argon and the deposition rate of CrN coatings was explored. The target current of DP-PMS was featured by an initial peak, which was different from the triangular waveform in PMS. The DP-PMS with a longer ignition pulse produced a higher substrate current and a larger number of Cr0 at unit target power. There existed a proper width of initial ignition pulse (e.g. 15 us) producing the maximum deposition rate at unit target power, which was nearly four times higher than that of PMS.",

keywords = "CrN coating, Deposition rate, Dual-pulse pulsed magnetron sputtering, Ignition pulse, Pulse width",

author = "Houpu Wu and Qinwen Tian and Xiubo Tian and Chunzhi Gong and Xinyu Zhang and Zhongzhen Wu",

note = "Publisher Copyright: {\textcopyright} 2019 Elsevier B.V.",

year = "2019",

month = sep,

day = "25",

doi = "10.1016/j.surfcoat.2019.06.016",

language = "英语",

volume = "374",

pages = "383--392",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

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TY - JOUR

T1 - Enhancement of discharge and deposition rate in dual-pulse pulsed magnetron sputtering

T2 - Effect of ignition pulse width

AU - Wu, Houpu

AU - Tian, Qinwen

AU - Tian, Xiubo

AU - Gong, Chunzhi

AU - Zhang, Xinyu

AU - Wu, Zhongzhen

PY - 2019/9/25

Y1 - 2019/9/25

N2 - To increase deposition rate during pulsed magnetron sputtering (PMS), a novel dual-pulse pulsed magnetron sputtering (DP-PMS) was proposed. The discharge mode of DP-PMS firstly produced a pulsed high ignition voltage with short duration followed by a subsequent pulsed low work voltage with long duration. CrN coatings were deposited by DP-PMS and PMS. The effect of ignition pulse width of DP-PMS on the discharge of Cr target in argon and the deposition rate of CrN coatings was explored. The target current of DP-PMS was featured by an initial peak, which was different from the triangular waveform in PMS. The DP-PMS with a longer ignition pulse produced a higher substrate current and a larger number of Cr0 at unit target power. There existed a proper width of initial ignition pulse (e.g. 15 us) producing the maximum deposition rate at unit target power, which was nearly four times higher than that of PMS.

AB - To increase deposition rate during pulsed magnetron sputtering (PMS), a novel dual-pulse pulsed magnetron sputtering (DP-PMS) was proposed. The discharge mode of DP-PMS firstly produced a pulsed high ignition voltage with short duration followed by a subsequent pulsed low work voltage with long duration. CrN coatings were deposited by DP-PMS and PMS. The effect of ignition pulse width of DP-PMS on the discharge of Cr target in argon and the deposition rate of CrN coatings was explored. The target current of DP-PMS was featured by an initial peak, which was different from the triangular waveform in PMS. The DP-PMS with a longer ignition pulse produced a higher substrate current and a larger number of Cr0 at unit target power. There existed a proper width of initial ignition pulse (e.g. 15 us) producing the maximum deposition rate at unit target power, which was nearly four times higher than that of PMS.

KW - CrN coating

KW - Deposition rate

KW - Dual-pulse pulsed magnetron sputtering

KW - Ignition pulse

KW - Pulse width

UR - https://www.scopus.com/pages/publications/85067191601

U2 - 10.1016/j.surfcoat.2019.06.016

DO - 10.1016/j.surfcoat.2019.06.016

M3 - 文章

AN - SCOPUS:85067191601

SN - 0257-8972

VL - 374

SP - 383

EP - 392

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -

Enhancement of discharge and deposition rate in dual-pulse pulsed magnetron sputtering: Effect of ignition pulse width

Abstract

Keywords

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