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Electron beam evaporation behaviors of TiAl alloys

  • Harbin Institute of Technology
  • Harbin Institute of Technology
  • China Aviation Industry Corporation

Research output: Contribution to journalArticlepeer-review

Abstract

A mathematical model for the calculation of TiAl alloy evaporation and deposition was developed. The activity coefficients of the elements represent the interaction between the components in the liquid pool. It is found that the main parameters affecting the evaporation rate include the activity coefficients and saturation vapor pressures of the elements. Experimental data are coincided with calculated data well. The results show that TiAl alloy can be deposited using the so-called single-crucible consisting of a water-cooled copper crucible with the base material being fed continuously through the bottom of the crucible.

Original languageEnglish
Pages (from-to)1759-1762
Number of pages4
JournalXiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering
Volume36
Issue number10
StatePublished - Oct 2007

Keywords

  • Activity coefficient
  • Electron beam physical vapor deposition
  • Evaporation
  • Saturation vapor pressure
  • TiAl

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