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Electrodeposition of La-Ni alloy films in a nonaqueous system

  • M. Z. An*
  • , J. L. Wang
  • , D. Z. Sun
  • *Corresponding author for this work
  • Harbin Institute of Technology

Research output: Contribution to journalArticlepeer-review

Abstract

The codeposition of La-Ni alloy films in a nonaqueous system was investigated. The effects of several factors including the concentrations of main salts, pH, temperature, current density and substrates on the lanthanum content in the deposit were studied. The results show that the lanthanum content in the deposit can reach 18 wt % by controlling the system composition and deposition conditions. X-ray photoelectron spectrometry, X-ray diffraction and scanning electron microscope were used to characterize the morphology and structure of the deposit. The results show that the majority of lanthanum exists in the form of LaH2, while the rest exists as metal and its oxide in the deposit, and the structure of the alloy deposited is amorphous.

Original languageEnglish
Pages (from-to)891-896
Number of pages6
JournalJournal of Applied Electrochemistry
Volume31
Issue number8
DOIs
StatePublished - Aug 2001

Keywords

  • Electrodeposition
  • Functional film
  • La-Ni alloy
  • Microelectrode
  • Nonaqueous solvent

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