Effects of surface oxygen on carbon films synthesized by plasma enhanced chemical vapor deposition

Fangwei Wang; Yujin Wang; Lei Chen; Boxin Wei; Sue Hao

doi:10.1016/j.matlet.2016.06.082

Effects of surface oxygen on carbon films synthesized by plasma enhanced chemical vapor deposition

Fangwei Wang
, Yujin Wang^*
, Lei Chen
, Boxin Wei
, Sue Hao

^*Corresponding author for this work

Harbin Institute of Technology

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

Carbon films were deposited on copper substrates from ethanol by plasma enhanced chemical vapor deposition. For the very first time, we report that surface oxygen on the copper foil is crucial to the growth of carbon films. The effects of surface oxygen on the growth of carbon films were investigated by XRD, SEM and Raman spectroscopy. The results indicated that surface oxygen on copper substrate played a dual role in determining the structure, phase and morphology of carbon films. Notably, pure, uniform and compact carbon films can be obtained when the oxidation exposure time reached 45 min. Furthermore, the intensity ratio I_(D)/I_(G) of carbon film has been calculated, suggesting that the content of Sp² atomic sites increased with the increase of the surface oxygen.

Original language	English
Pages (from-to)	52-54
Number of pages	3
Journal	Materials Letters
Volume	182
DOIs	https://doi.org/10.1016/j.matlet.2016.06.082
State	Published - 1 Nov 2016

Keywords

Chemical vapor deposition
Microstructure
Oxidation
films

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10.1016/j.matlet.2016.06.082

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title = "Effects of surface oxygen on carbon films synthesized by plasma enhanced chemical vapor deposition",

abstract = "Carbon films were deposited on copper substrates from ethanol by plasma enhanced chemical vapor deposition. For the very first time, we report that surface oxygen on the copper foil is crucial to the growth of carbon films. The effects of surface oxygen on the growth of carbon films were investigated by XRD, SEM and Raman spectroscopy. The results indicated that surface oxygen on copper substrate played a dual role in determining the structure, phase and morphology of carbon films. Notably, pure, uniform and compact carbon films can be obtained when the oxidation exposure time reached 45 min. Furthermore, the intensity ratio I(D)/I(G) of carbon film has been calculated, suggesting that the content of Sp2 atomic sites increased with the increase of the surface oxygen.",

keywords = "Chemical vapor deposition, Microstructure, Oxidation, films",

author = "Fangwei Wang and Yujin Wang and Lei Chen and Boxin Wei and Sue Hao",

note = "Publisher Copyright: {\textcopyright} 2016 Elsevier B.V.",

year = "2016",

month = nov,

day = "1",

doi = "10.1016/j.matlet.2016.06.082",

language = "英语",

volume = "182",

pages = "52--54",

journal = "Materials Letters",

issn = "0167-577X",

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TY - JOUR

T1 - Effects of surface oxygen on carbon films synthesized by plasma enhanced chemical vapor deposition

AU - Wang, Fangwei

AU - Wang, Yujin

AU - Chen, Lei

AU - Wei, Boxin

AU - Hao, Sue

PY - 2016/11/1

Y1 - 2016/11/1

N2 - Carbon films were deposited on copper substrates from ethanol by plasma enhanced chemical vapor deposition. For the very first time, we report that surface oxygen on the copper foil is crucial to the growth of carbon films. The effects of surface oxygen on the growth of carbon films were investigated by XRD, SEM and Raman spectroscopy. The results indicated that surface oxygen on copper substrate played a dual role in determining the structure, phase and morphology of carbon films. Notably, pure, uniform and compact carbon films can be obtained when the oxidation exposure time reached 45 min. Furthermore, the intensity ratio I(D)/I(G) of carbon film has been calculated, suggesting that the content of Sp2 atomic sites increased with the increase of the surface oxygen.

AB - Carbon films were deposited on copper substrates from ethanol by plasma enhanced chemical vapor deposition. For the very first time, we report that surface oxygen on the copper foil is crucial to the growth of carbon films. The effects of surface oxygen on the growth of carbon films were investigated by XRD, SEM and Raman spectroscopy. The results indicated that surface oxygen on copper substrate played a dual role in determining the structure, phase and morphology of carbon films. Notably, pure, uniform and compact carbon films can be obtained when the oxidation exposure time reached 45 min. Furthermore, the intensity ratio I(D)/I(G) of carbon film has been calculated, suggesting that the content of Sp2 atomic sites increased with the increase of the surface oxygen.

KW - Chemical vapor deposition

KW - Microstructure

KW - Oxidation

KW - films

UR - https://www.scopus.com/pages/publications/84976541280

U2 - 10.1016/j.matlet.2016.06.082

DO - 10.1016/j.matlet.2016.06.082

M3 - 文章

AN - SCOPUS:84976541280

SN - 0167-577X

VL - 182

SP - 52

EP - 54

JO - Materials Letters

JF - Materials Letters

ER -

Effects of surface oxygen on carbon films synthesized by plasma enhanced chemical vapor deposition

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Keywords

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