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Effects of plasma excitation power, sample bias, and duty cycle on the structure and surface properties of amorphous carbon thin films fabricated on AISI440 steel by plasma immersion ion implantation

  • Z. M. Zeng*
  • , X. B. Tian
  • , T. K. Kwok
  • , B. Y. Tang
  • , M. K. Fung
  • , P. K. Chu
  • *Corresponding author for this work
  • City University of Hong Kong
  • Harbin Institute of Technology

Research output: Contribution to journalConference articlepeer-review

Abstract

Plasma immersion ion implantation (PIII) was used to synthesize the amorphous carbon thin films on AISI440 steel. Raman spectroscopy, Auger electron spectroscopy, friction coefficient measurement and wear test were used to investigate the effect of the processing parameters, like radio frequency power, sample voltage pulse duty cycle, and target bias on the structure and surface properties of the films. The structure and surface properties were found to differ greatly under different PIII conditions.

Original languageEnglish
Pages (from-to)2164-2168
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume18
Issue number5
DOIs
StatePublished - Sep 2000
Event47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing - Boston, USA
Duration: 2 Oct 20006 Oct 2000

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