Effect of RF-sputtering parameters on texture in Pb(Zr, Ti)O₃ films

Lead zirconate titanate (PZT) ferroelectric film was prepared by RF-magnetron sputtering route. The phase composition and the effect of sputtering parameter on the texture of the films were analyzed by X-ray diffraction (XRD) technique. The results of XRD results indicate that high sputtering power is not beneficial to deposit PZT thin films with pure perovskite structure, when the substrate-target distance is too short. The preferential orientation of PZT thin films is affected by the sputtering power and pressure. The misorientation degree of (111) texture increases with the sputtering pressure and sputtering power increasing. Highly oriented PZT films can be obtained under suitable sputtering conditions. When the substrate-target distance is 80 mm, highly (100) textured PZT film can be obtained if the sputtering pressure of 0.7 Pa and the sputtering power of 150 W were selected.