Effect of R.F. power on structures and properties of amorphous fluorinated carbon films prepared by PSII

Guang Ze Tang; Xinxin Ma; Mingren Sun

doi:10.4028/www.scientific.net/kem.353-358.1829

Effect of R.F. power on structures and properties of amorphous fluorinated carbon films prepared by PSII

Guang Ze Tang^*
, Xinxin Ma
, Mingren Sun

^*Corresponding author for this work

Harbin Institute of Technology

Research output: Contribution to journal › Conference article › peer-review

Abstract

Fluorinated amorphous carbon films (a-C:H:F) were deposited by plasma source ion implantation (PSII) with precursor gas of CH₂FCF ₃ + C₂H₂ + H₂ with various radio frequency (r.f.) power. Structures and properties evolution varied with r.f. power was discussed in detail. X-ray photoelectron spectroscopy (XPS), Raman spectrum, X-Ray reflection(XRR), atomic force microscopy (AFM) were used to analyze composition, chemical state, sp² cluster structure, density and surface morphology of prepared films. Nano-indentation test was used to get hardness and modulus. The results show that with the increase of r.f. power, the size and amount of sp² cluster increase, so does the surface roughness; however, the density and the hardness of films decrease.

Original language	English
Pages (from-to)	1829-1832
Number of pages	4
Journal	Key Engineering Materials
Volume	353-358
Issue number	PART 3
DOIs	https://doi.org/10.4028/www.scientific.net/kem.353-358.1829
State	Published - 2007
Externally published	Yes
Event	Asian Pacific Conference for Fracture and Strength (APCFS'06) - Sanya, Hainan Island, China Duration: 22 Nov 2006 → 25 Nov 2006

Keywords

A-C:F films
PSII
Property
Structure

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Cite this

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title = "Effect of R.F. power on structures and properties of amorphous fluorinated carbon films prepared by PSII",

abstract = "Fluorinated amorphous carbon films (a-C:H:F) were deposited by plasma source ion implantation (PSII) with precursor gas of CH2FCF 3 + C2H2 + H2 with various radio frequency (r.f.) power. Structures and properties evolution varied with r.f. power was discussed in detail. X-ray photoelectron spectroscopy (XPS), Raman spectrum, X-Ray reflection(XRR), atomic force microscopy (AFM) were used to analyze composition, chemical state, sp2 cluster structure, density and surface morphology of prepared films. Nano-indentation test was used to get hardness and modulus. The results show that with the increase of r.f. power, the size and amount of sp2 cluster increase, so does the surface roughness; however, the density and the hardness of films decrease.",

keywords = "A-C:F films, PSII, Property, Structure",

author = "Tang, \{Guang Ze\} and Xinxin Ma and Mingren Sun",

year = "2007",

doi = "10.4028/www.scientific.net/kem.353-358.1829",

language = "英语",

volume = "353-358",

pages = "1829--1832",

journal = "Key Engineering Materials",

issn = "1013-9826",

publisher = "Trans Tech Publications Ltd",

number = "PART 3",

note = "Asian Pacific Conference for Fracture and Strength (APCFS'06) ; Conference date: 22-11-2006 Through 25-11-2006",

}

TY - JOUR

T1 - Effect of R.F. power on structures and properties of amorphous fluorinated carbon films prepared by PSII

AU - Tang, Guang Ze

AU - Ma, Xinxin

AU - Sun, Mingren

PY - 2007

Y1 - 2007

N2 - Fluorinated amorphous carbon films (a-C:H:F) were deposited by plasma source ion implantation (PSII) with precursor gas of CH2FCF 3 + C2H2 + H2 with various radio frequency (r.f.) power. Structures and properties evolution varied with r.f. power was discussed in detail. X-ray photoelectron spectroscopy (XPS), Raman spectrum, X-Ray reflection(XRR), atomic force microscopy (AFM) were used to analyze composition, chemical state, sp2 cluster structure, density and surface morphology of prepared films. Nano-indentation test was used to get hardness and modulus. The results show that with the increase of r.f. power, the size and amount of sp2 cluster increase, so does the surface roughness; however, the density and the hardness of films decrease.

AB - Fluorinated amorphous carbon films (a-C:H:F) were deposited by plasma source ion implantation (PSII) with precursor gas of CH2FCF 3 + C2H2 + H2 with various radio frequency (r.f.) power. Structures and properties evolution varied with r.f. power was discussed in detail. X-ray photoelectron spectroscopy (XPS), Raman spectrum, X-Ray reflection(XRR), atomic force microscopy (AFM) were used to analyze composition, chemical state, sp2 cluster structure, density and surface morphology of prepared films. Nano-indentation test was used to get hardness and modulus. The results show that with the increase of r.f. power, the size and amount of sp2 cluster increase, so does the surface roughness; however, the density and the hardness of films decrease.

KW - A-C:F films

KW - PSII

KW - Property

KW - Structure

UR - https://www.scopus.com/pages/publications/36049020971

U2 - 10.4028/www.scientific.net/kem.353-358.1829

DO - 10.4028/www.scientific.net/kem.353-358.1829

M3 - 会议文章

AN - SCOPUS:36049020971

SN - 1013-9826

VL - 353-358

SP - 1829

EP - 1832

JO - Key Engineering Materials

JF - Key Engineering Materials

IS - PART 3

T2 - Asian Pacific Conference for Fracture and Strength (APCFS'06)

Y2 - 22 November 2006 through 25 November 2006

ER -

Effect of R.F. power on structures and properties of amorphous fluorinated carbon films prepared by PSII

Abstract

Keywords

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