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Effect of ion etching on polymethyl methacrylate surface

  • Wang Lishuan*
  • , Liu Huasong
  • , Jiang Yugang
  • , Liu Dandan
  • , Jiang Chenghui
  • , Ji Yiqin
  • , Fan Rongwei
  • , Chen Deying
  • *Corresponding author for this work
  • HIWING Technology Academy of CASIC
  • Harbin Institute of Technology

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The effect of argon ion treatment on PMMA substrate has been studied. The surface topography and roughness was measured by AFM. And optical properties such as spectroscopic ellipsometry, transmittance and reflectance spectra were obtained also.

Original languageEnglish
Title of host publicationOptical Interference Coatings, OIC 2016
PublisherOptica Publishing Group (formerly OSA)
ISBN (Print)9781943580132
StatePublished - 2016
EventOptical Interference Coatings, OIC 2016 - Tucson, United States
Duration: 19 Jun 201624 Jun 2016

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Conference

ConferenceOptical Interference Coatings, OIC 2016
Country/TerritoryUnited States
CityTucson
Period19/06/1624/06/16

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